Fortunato, Elvira, Lavareda Guilherme Martins Rodrigo Soares Fernando Fernandes Luis. "
High-detection resolution presented by large-area thin-film position-sensitive detectors."
Proceedings of SPIE - The International Society for Optical Engineering. Vol. 2397. 1995. 259-270.
AbstractThe aim of this work is to present the main optoelectronic characteristics of large area 1D position sensitive detectors based on amorphous silicon p-i-n diodes. From that, the device resolution, response time and detectivity are derived and discussed concerning the field of applications of the 1D thin film position sensitive detectors.
Fortunato, E.a, Assunção Gonçalves Marques Águas Pereira Ferreira Vilarinho Martins V. a A. a. "
High quality conductive gallium-doped zinc oxide films deposited at room temperature."
Thin Solid Films. 451-452 (2004): 443-447.
AbstractTransparent and highly conducting gallium-doped zinc oxide films were successfully deposited by rf sputtering at room temperature. The lowest resistivity achieved was 2.6×10-4 Ω cm for a thickness of 1100 nm (sheet resistance ≈1.6 Ω/sq), with a Hall mobility of 18 cm2/Vs and a carrier concentration of 1.3×1021 cm-3. The films are polycrystalline with a hexagonal structure and a strongly preferred orientation along the c-axis. A linear dependence between the mobility and the crystallite size was obtained. The films present a transmittance in the visible spectra between 80 and 90% and a refractive index of approximately 2, which is very close to the value reported for bulk material. © 2003 Elsevier B.V. All rights reserved.
Fortunato, E.a, Nunes Marques Costa Águas Ferreira Costa Martins P. a A. a. "
Zinc oxide thin films deposited by rf magnetron sputtering on mylar substrates at room temperature."
Materials Research Society Symposium Proceedings. Vol. 685. 2001. 140-145.
AbstractAluminium doped zinc oxide thin films (ZnO:Al) have been deposited on polyester (Mylar type D, 100 μm thickness) substrates at room temperature by r.f. magnetron sputtering. The structural, morphological, optical and electrical properties of the deposited films have been studied. The samples are polycrystalline with a hexagonal wurtzite structure and a strong crystallographic c-axis orientation (002) perpendicular to the substrate surface. The ZnO:Al thin films with 85% transmittance in the visible and infra-red region and a resistivity as low as 3.6×102 Ωcm have been obtained, as deposited. The obtained results are comparable to those ones obtained on glass substrates, opening a new field of low cost, light weight, small volume, flexible and unbreakable large area optoelectronic devices. © 2001 Materials Research Society.
Fortunato, E., Pimentel Pereira Gonçalves Lavareda Águas Ferreira Carvalho Martins A. L. A. "
High field-effect mobility zinc oxide thin film transistors produced at room temperature."
Journal of Non-Crystalline Solids. 338-340 (2004): 806-809.
AbstractIn this paper we present the first results of thin film transistors produced completely at room temperature using ZnO as the active channel and silicon oxynitride as the gate dielectric. The ZnO-based thin film transistors (ZnO-TFT) present an average optical transmission (including the glass substrate) of 84% in the visible part of the spectrum. The ZnO-TFT operates in the enhancement mode with a threshold voltage of 1.8 V. A field effect mobility of 70 cm2/Vs, a gate voltage swing of 0.68 V/decade and an on-off ratio of 5×105 were obtained. The combination of transparency, high field-effect mobility and room temperature processing makes the ZnO-TFT very promising for the next generation of invisible and flexible electronics. © 2004 Elsevier B.V. All rights reserved.
Fortunato, E.a, Nunes Marques Costa Águas Ferreira Costa Godinho Almeida Borges Martins P. a A. a. "
Transparent, conductive ZnO:Al thin film deposited on polymer substrates by RF magnetron sputtering."
Surface and Coatings Technology. 151-152 (2002): 247-251.
AbstractIn this paper, we present the optical, electrical, structural and mechanical properties exhibited by aluminum-doped zinc oxide (ZnO:Al) thin films produced by RF magnetron sputtering on polymeric substrates (polyethylene terephthalate, PET; Mylar type D from Dupont®) with a standard thickness of 100 μm. The influence of the uniaxial tensile strain on the electrical resistance of these films was evaluated in situ for the first time during tensile elongation. In addition, the role of the thickness on the mechanical behavior of the films was also evaluated. The preliminary results reveal that the increase in electrical resistance is related to the number of cracks, as well as the crack width, which also depends on the film thickness. © 2002 Elsevier Science B.V. All rights reserved.
Fortunato, E., Malik Seco Macarico Martins A. A. A. "
High sensitivity photochemical sensors based on amorphous silicon."
Materials Research Society Symposium - Proceedings. Vol. 467. 1997. 949-954.
AbstractHydrogenated amorphous silicon photochemical sensors based on Pd-MIS structures were produced by Plasma Enhanced Chemical Vapor Deposition with two different oxidized surfaces (thermal and chemical oxidation). The behaviour of dark and illuminated current-voltage characteristics in air and in the presence of a hydrogen atmosphere is explained by the changes induced by the gases in the work function of the metal, modifying the electrical properties of the interface. The photochemical sensors produced present more than 2 orders of magnitude variation on the reverse dark current when in presence of 400 ppm hydrogen to which it corresponds a decrease of 45% on the open circuit voltage.
Fortunato, E., Barquinha Pereira Gonçalves Martins P. L. G. "
Multicomponent wide band gap oxide semiconductors for thin film transistors."
Proceedings of International Meeting on Information Display. Vol. 2006. 2006. 605-608.
AbstractThe recent application of wide band gap oxide semiconductors to transparent thin film transistors (TTFTs) is making a fast and growing (r)evolution on the contemporary solid-state electronics. In this paper we present some of the recent results we have obtained using wide band gap oxide semiconductors, like indium zinc oxide, produced by rf sputtering at room temperature. The devices work in the enhancement mode and exhibit excellent saturation drain currents. On-off ratios above 106 are achieved. The optical transmittance data in the visible range reveals average transmittance higher than 80%, including the glass substrate. Channel mobilities are also quite respectable, with some devices presenting values around 25 cm2/Vs, even without any annealing or other post deposition improvement processes. The high performances presented by these TTFTs associated to a high electron mobility, at least two orders of magnitude higher than that of conventional amorphous silicon TFTs and a low threshold voltage, opens new doors for applications in flexible, wearable, disposable portable electronics as well as battery-powered applications.
Fortunato, E., Gonçalves Marques Assunção Ferreira Águas Pereira Martins A. A. V. "
Gallium zinc oxide coated polymeric substrates for optoelectronic applications."
Materials Research Society Symposium - Proceedings. Vol. 769. 2003. 291-296.
AbstractHighly transparent and conductive ZnO:Ga thin films were produced by rf magnetron sputtering at room temperature on polyethylene naphthalate substrates. The films present a good electrical and optical stability, surface uniformity and a very good adhesion to the polymeric substrates. The lowest resistivity obtained was 5×10-4 Ωcm with a sheet resistance of 15 Ω/sqr and an average optical transmittance in the visible part of the spectra of 80%. It was also shown that by passivating the polymeric surface with a thin SiO2 layer, the electrical and structural properties of the films are improved nearly by a factor of 2.
Fortunato, E., Fernandes Soares Lavareda Martins M. F. G. "
From intelligent materials to smart sensors: a-Si:H position sensitive detectors."
Materials Research Society Symposium - Proceedings. Vol. 420. 1996. 165-170.
AbstractThis work presents the main static and dynamic performances showed by one dimensional thin film position sensitive detectors (1D TFPSD), based on a-Si:H technology, with a size of 80 mm × 5 mm. The results obtained show that the TFPSD is able to respond to light powers as low as 2μ W/cm2, presenting a detection accuracy, linearity and response frequency better than 10 μm, 2% and 2 KHz, respectively. These results are quite promising regarding the application of these sensors to a wide variety of optical inspection systems where continuous quality control is required.
Fortunato, E., Soares Lavareda Martins F. G. R. "
New linear array thin film position sensitive detector (LTFPSD) for 3D measurements."
Materials Research Society Symposium - Proceedings. Vol. 377. 1995. 797-802.
AbstractA Linear array Thin Film Position Sensitive Detector (LTFPSD) based on hydrogenated amorphous silicon (a-Si:H) is proposed for the first time, taking advantage of the optical properties presented by a-Si:H devices we have developed a LTFPSD with 128 integrated elements able to be used in 3D inspections/measurements. Each element consists on an one-dimensional TFPSD, based on a p.i.n. diode produced in a conventional PECVD system, where the doped layers are coated with thin resistive layers to establish the required device equipotentials. By proper incorporation of the LTFPSD into an optical inspection camera it will be possible to acquire information about an object/surface, through the optical cross-section method. The main advantages of this system, when compared with the conventional CCDs, are the low complexity of hardware and software used and that the information can be continuously processed (analogue detection).
Fortunato, E.a, Vieira Lavareda Ferreira Martins M. a G. a. "
Material properties, project design rules and performances of single and dual-axis a-Si:H large area position sensitive detectors."
Journal of Non-Crystalline Solids. 164-166 (1993): 797-800.
AbstractWe have developed large area (up to 80mm×80mm) Thin Film Position Sensitive Detectors (TFPSD) based on hydrogenated amorphous silicon (a-Si:H). Although crystalline silicon PSDs have been realized and applied to optical systems, their detection area is small (less than 10mm×10mm), which implies the need of optical magnification systems for supporting their field of applications towards large area inspection systems, which does not happen by using a-Si:H devices. The key factors for the TFPSDs resolution are the thickness uniformity of the constituting layers, the geometry and the position of the contacts. In this paper we present data on single and dual-axis rectangular TFPSDs correlating, their performances with the different underlying lateral effects. For the single axis-detector, with two opposite extended contacts, the output photocurrent difference to sum ratio is a linear function of the position of a narrow incident light beam, even for low illumination levels (below 20 lux). For the dual-axis detector with extended contacts, at all four sides (except for small gaps at the vertices due to edge effects) an almost linear relation has been found between the incident light spot position along both axis and the corresponding output photocurrents. © 1993.