Águas, Hugo, Lu{\'ıs Pereira, Isabel Ferreira, A. R. Ramos, A. S. Viana, J. Andreu, Paula M. Vilarinho, Elvira Fortunato, and Rodrigo Martins. "
Effect of annealing on gold rectifying contacts in amorphous silicon."
Materials Science Forum. Vol. 455. Trans Tech Publications, 2004. 96-99.
Abstractn/a
Martins, R., H. Aguas, I. Ferreira, E. Fortunato, L. Raniero, and P. Roca Cabarrocas. "
Electronic, Optoelectronic, Spintronic and Ferroelectric Materials-Composition, Structure and Optical Characteristics of Polymorphous Silicon Films Deposited by PECVD at 27.12 MHz."
Materials Science Forum. Vol. 455. Aedermannsdorf, Switzerland: Trans Tech Publications, 1984-, 2004. 100-103.
Abstractn/a
Aguas, H., L. Pereira, L. Raniero, E. Fortunato, and R. Martins. "
Electronic, Optoelectronic, Spintronic and Ferroelectric Materials-MIS Photodiodes of Polymorphous Silicon Deposited at Higher Growth Rates by 27.12 MHz PECVD Discharge."
Materials Science Forum. Vol. 455. Aedermannsdorf, Switzerland: Trans Tech Publications, 1984-, 2004. 73-76.
Abstractn/a
Pereira, L., H. Aguas, L. Raniero, R. M. S. Martins, E. Fortunato, and R. Martins. "
Electronic, Optoelectronic, Spintronic and Ferroelectric Materials-Role of Substrate on the Growth Process of Polycrystalline Silicon Thin Films by Low-Pressure Chemical Vapour Deposition."
Materials Science Forum. Vol. 455. Aedermannsdorf, Switzerland: Trans Tech Publications, 1984-, 2004. 112-115.
Abstractn/a
Pereira, L., H. Aguas, R. Igreja, R. M. S. Martins, N. Nedev, L. Raniero, E. Fortunato, and R. Martins. "
Electronic, Optoelectronic, Spintronic and Ferroelectric Materials-Sputtering Preparation of Silicon Nitride Thin Films for Gate Dielectric Applications."
Materials Science Forum. Vol. 455. Aedermannsdorf, Switzerland: Trans Tech Publications, 1984-, 2004. 69-72.
Abstractn/a
Fortunato, E., V. Assuncao, A. Marques, A. Goncalves, H. Aguas, L. Pereira, I. Ferreira, FMB Fernandes, R. J. C. Silva, and R. Martins. "
Electronic, Optoelectronic, Spintronic and Ferroelectric Materials-ZnO: Ga Thin Films Produced by RF Sputtering at Room Temperature: Effect of the Power Density."
Materials Science Forum. Vol. 455. Aedermannsdorf, Switzerland: Trans Tech Publications, 1984-, 2004. 12-15.
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