Publications

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2002
Fortunato, Elvira, Donatelo Brida, Luis Pereira, Hugo Águas, Vitor Silva, Isabel Ferreira, M. F. M. Costa, Vasco Teixeira, and Rodrigo Martins. "Dependence of the Strains and Residual Mechanical Stresses on the Performances Presented by a-Si: H Thin Film Position Sensors." Advanced Engineering Materials. 4 (2002): 612-616. Abstract
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Martins, R., I. Ferreira, H. Águas, V. Silva, E. Fortunato, and L. Guimarães. "Engineering of a-Si: H device stability by suitable design of interfaces." Solar energy materials and solar cells. 73 (2002): 39-49. Abstract
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Águas, H., E. Fortunato, V. Silva, L. Pereira, and R. Martins. "High quality a-Si: H films for MIS device applications." Thin solid films. 403 (2002): 26-29. Abstract
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Fortunato, Elvira, Patr{\'ıcia Nunes, António Marques, Daniel Costa, Hugo Águas, Isabel Ferreira, Maria Elisabete V. Costa, and Rodrigo Martins. "Highly conductive/transparent ZnO: Al thin films deposited at room temperature by rf magnetron sputtering." Key Engineering Materials. Vol. 230. Trans Tech Publications, 2002. 571-574. Abstract
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Águas, Hugo, Elvira Fortunato, and Rodrigo Martins. "Influence of a DC grid on silane rf plasma properties." Vacuum. 64 (2002): 387-392. Abstract
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Águas, Hugo, Rodrigo Martins, and Elvira Fortunato. "Influence of the Plasma Regime on the Structural, Optical and Transport Properties of a-Si: H Thin Films." Key Engineering Materials. Vol. 230. Trans Tech Publications, 2002. 583-586. Abstract
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Fortunato, Elvira, Patricia Nunes, António Marques, Daniel Costa, Hugo Aguas, Isabel Ferreira, M. E. V. Costa, Maria H. Godinho, Pedro L. Almeida, Joao P. Borges, and others. "Influence of the strain on the electrical resistance of zinc oxide doped thin film deposited on polymer substrates." Advanced Engineering Materials. 4 (2002): 610-612. Abstract
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Kholkin, AL, R. Martins, H. Aguas, I. Ferreira, V. Silva, OA Smirnova, M. E. V. Costa, P. M. Vilarinho, E. Fortunato, and JL Baptista. "Metal-ferroelectric thin film devices." Journal of non-crystalline solids. 299 (2002): 1311-1315. Abstract
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Brida, D., E. Fortunato, H. Aguas, V. Silva, A. Marques, L. Pereira, I. Ferreira, and R. Martins. "New insights on large area flexible position sensitive detectors." Journal of non-crystalline solids. 299 (2002): 1272-1276. Abstract
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Águas, H., E. Fortunato, and R. Martins. "Role of the i layer surface properties on the performance of a-Si: H Schottky barrier photodiodes." Sensors and Actuators A: Physical. 99 (2002): 220-223. Abstract
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Águas, Hugo, Elvira Fortunato, Lu{\'ıs Pereira, V. Silva, and Rodrigo Martins. "Role of the i-Layer Thickness in the Performance of a-Si: H Schottky Barrier Photodiodes." Key Engineering Materials. Vol. 230. Trans Tech Publications, 2002. 587-590. Abstract
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Martins, R., H. Águas, V. Silva, I. Ferreira, A. Cabrita, and E. Fortunato. "Silicon nanostructure thin film materials." Vacuum. 64 (2002): 219-226. Abstract
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Fortunato, E., P. Nunes, A. Marques, D. Costa, H. Águas, I. Ferreira, M. E. V. Costa, M. H. Godinho, PL Almeida, J. P. Borges, and others. "Transparent, conductive ZnO: Al thin film deposited on polymer substrates by RF magnetron sputtering." Surface and coatings technology. 151 (2002): 247-251. Abstract
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2001
Fortunato, Elvira, Patr{\'ıcia Nunes, António Marques, Daniel Costa, Hugo Águas, Isabel Ferreira, Maria EV Costa, and Rodrigo Martins. "Characterization of Zinc Oxide Thin Films Deposited by rf Magnetron Sputtering on Mylar Substrates." MRS Proceedings. Vol. 666. Cambridge University Press, 2001. F3-21. Abstract
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Aguas, H., Y. Nunes, E. Fortunato, P. Gordo, M. Maneira, and R. Martins. "Correlation between a-Si: H surface oxidation process and the performance of MIS structures." Thin solid films. 383 (2001): 185-188. Abstract
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Martins, R., V. Silva, H. Águas, A. Cabrita, I. Ferreira, and E. Fortunato. "Correlation between the carbon and hydrogen contents with the gas species and the plasma impedance of silicon carbide films produced by PECVD technique." Applied surface science. 184 (2001): 101-106. Abstract
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Águas, Hugo, António Marques, Rodrigo Martins, and Elvira Fortunato. "Fast and cheap method to qualitatively measure the thickness and uniformity of ZrO 2 thin films." Materials Science in Semiconductor Processing. 4 (2001): 319-321. Abstract
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Águas, Hugo, Rodrigo Martins, Yuri Nunes, Manuel JP Maneira, and Elvira Fortunato. "Influence of the Plasma Regime on the Structural, Optical, Electrical and Morphological Properties of a-Si: H Thin Films." Materials Science Forum. Vol. 382. Trans Tech Publications, 2001. 11-20. Abstract
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Ferreira, I., V. Silva, H. Águas, E. Fortunato, and R. Martins. "Mass spectroscopy analysis during the deposition of a-SiC: H and aC: H films produced by hot wire and hot wire plasma-assisted techniques." Applied surface science. 184 (2001): 60-65. Abstract
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Martins, R., H. Aguas, V. Silva, I. Ferreira, A. Cabrita, and E. Fortunato. "Nanostructured silicon films produced by PECVD." MRS Proceedings. Vol. 664. Cambridge University Press, 2001. A9-6. Abstract
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Martins, R., H. Aguas, A. Cabrita, P. Tonello, V. Silva, I. Ferreira, E. Fortunato, and L. Guimarães. "New nanostructured silicon films grown by PECVD technique under controlled powder formation conditions." Solar energy. 69 (2001): 263-269. Abstract
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Martins, Rodrigo, Isabel Ferreira, Ana Cabrita, Hugo Águas, Vitor Silva, and Elvira Fortunato. "New Steps to Improve a-Si: H Device Stability by Design of the Interfaces." Advanced Engineering Materials. 3 (2001): 170-173. Abstract
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Fortunato, E., D. Brida, I. Ferreira, H. Águas, P. Nunes, and R. Martins. "Production and characterization of large area flexible thin film position sensitive detectors." Thin Solid Films. 383 (2001): 310-313. Abstract
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Martins, R., H. Aguas, I. Ferreira, V. Silva, A. Cabrita, and E. Fortunato. "Role of ion bombardment and plasma impedance on the performances presented by undoped a-Si: H films." Thin Solid Films. 383 (2001): 165-168. Abstract
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Aguas, Hugo, R. Martins, and E. Fortunato. "Role of ion bombardment on the properties of a-Si: H films." Vacuum. 60 (2001): 247-254. Abstract
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