Growth of polymorphous/nanocrystalline silicon films deposited by PECVD at 13.56 MHz | Hugo Águas

Growth of polymorphous/nanocrystalline silicon films deposited by PECVD at 13.56 MHz

Citation:: Raniero, Leandro, Rodrigo Martins, Hugo Águas, S. Zang, Isabel Ferreira, Lu{\'ıs Pereira, Elvira Fortunato, and L. Boufendi. "Growth of polymorphous/nanocrystalline silicon films deposited by PECVD at 13.56 MHz." Materials Science Forum. Vol. 455. Trans Tech Publications, 2004. 532-535.

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