Batch processing method to deposit a-Si: H films by PECVD | Hugo Águas

Batch processing method to deposit a-Si: H films by PECVD

Citation:: Raniero, Leandro, Hugo Águas, Lu{\'ıs Pereira, Elvira Fortunato, Isabel Ferreira, and Rodrigo Martins. "Batch processing method to deposit a-Si: H films by PECVD." Materials Science Forum. Vol. 455. Trans Tech Publications, 2004. 104-107.

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