Rodrigo Martins

Indium-Tin-Oxide (ITO) thin films were deposited on glass substrates using DC magnetron reactive sputtering at different bias voltages and substrate temperatures. Some improvements were obtained on film properties, microstructure and other physical characteristics for different conditions. Amorphous and polycrystalline films can be obtained for various deposition conditions. The transmission, absorption, spectral and diffuse reflection of ITO films were measured in some ranges of UV-Vis-NIR. The refractive index (n), Energy band gap Eg and the surface roughness of the film were derived from the measured spectra data. The carrier density (nc) and the carrier mobility (μ) of the film micro conductive properties were discussed. The films exhibited suitable optical transmittance and conductivity for electrochromic applications. © 2002 Elsevier Science B.V. All rights reserved.

In this paper we demonstrate the use of amorphous binary In2O3-ZnO oxides simultaneously as active channel layer and as source/drain regions in transparent thin film transistor (TTFT), processed at room temperature by rf sputtering. The TTFTs operate in the enhancement mode and their performances are thickness dependent. The best TTFTs exhibit saturation mobilities higher than 102 cm2/Vs, threshold voltages lower than 6 V, gate voltage swing of 0.8 V/dec and an on/off current ratio of 107. This mobility is at least two orders of magnitude higher than that of conventional amorphous silicon TFTs and comparable to or even better than other polycrystal-line semiconductors. © 2007 Wiley-VCH Verlag GmbH & Co. KGaA, Weinheim.

A 32/128 linear array of 1-D amorphous silicon position sensitive detectors (PSD) was integrated into a self constructed suitable and portable data acquisition prototype system. The system is comprised by a commercially available existing electronics module suitable for photodiode data acquisition operations and by another adapter module, which allows for removal and replacement of the 32/128 PSD based sensor. This system is applied for imaging 3-D objects using the triangulation principle with a sheet-of-light laser. The sensor array response obtained from the reflected light of the object was fed into an electronic readout system and the corresponding signals were analyzed using the relevant data algorithm. The obtained results show a sensor nonlinearity of about 4%-7%, a wide sensor/system dynamic range and a 3-D profile spatial resolution supplied by each sensor strip of 339 μm, which can easily be reduced to 8.5 μm and even further with appropriate software modifications. © 2011 IEEE.

The position of a 40 μm wide by 400 μm long cantilever in a microscope was detected by a 32 lines array of 1D amorphous silicon position sensitive detectors (PSD). The sensor was placed in the ocular used for the CCD camera of a microscope and the alignment, focusing and positioning of the cantilever was achieved using the X-Y-Z translation table of the microscope that has a micrometer resolution controller. In this work we present results concerning the micro positioning of a cantilever and its holding structure through the reflected light that is detected by 1D/3D psd and converted to an analog signal proportional to the movement. The signal given by the 32 sensor array was analyzed directly without any electronic readout system or data algorithm. The obtained results show a linear behavior of the photovoltage relating X and Y movement, a non-linearity less than 2% and spatial resolution of 600 μV/μm. © 2006 Elsevier B.V. All rights reserved.

This paper reports the performances of metal/insulator/semiconductor devices, simultaneously sensitive to hydrogen and to the visible region of the spectrum. The sensors used in this work are based on glass/Cr/a-SiH(n+)/a-Si:H(i)/SiOx/Pd structures, where the amorphous silicon was deposited by conventional r.f. techniques and the oxide grown thermally (in air) or chemically (in hydrogen peroxide). The proposed sensors present a response of ∼ 3 orders of magnitude change in the saturation current when in the presence of 400 ppm of hydrogen and an open circuit voltage that decreases in the presence of hydrogen, with a maximum spectral response at 500 nm. These sensors were also compared with equivalent crystalline silicon devices whose oxides were prepared exactly in the same conditions as the ones used for the a-Si:H devices. © 1998 Elsevier Science B.V. All rights reserved.

The present paper describes the properties of a photochemical sensor based on amorphous silicon MIS (Metal-Insulator-Semiconductor) diodes. The structure of the sensors used in this work are based on glass/Cr/a-SiH(n +)/a-Si:H(i)SiOx/Pd, where the amorphous silicon layers have been deposited by conventional plasma r.f. techniques. The proposed photochemical sensors present a 2-3 orders of magnitude change in the saturation current and a decrease of up to 40% on the open circuit voltage when in the presence of 400 ppm of hydrogen. The overall performance of these sensors, associated with the low cost fabrication technology, suggests that, in the near future, it will be possible to use them in several industrial applications. © 1998 Elsevier Science Ltd. All rights reserved.

A series of hydrogenated amorphous silicon carbide (a-SiC:H) films was prepared by plasma enhanced chemical vapor deposition (PECVD) technology. The microstructure and photoelectronic properties of the film are investigated by absorption spectra (in the ultraviolet to near-infrared range) and Fourier transform infrared (FTIR) spectra. The results show that good band gap controllability (1.83-3.64 eV) was achieved by adjusting the plasma parameters. In the energy range around 2.1 eV, the a-Si1-xCx:H films exhibit good photosensitivity, opening the possibility to use this wide band gap material for device application, especially when blue color detectors are concerned. A multilayer device with a stack of glass/TCO(ZnO:Ga)/P(a-SiC:H)/I(a- SiC:H)/N(a-Si:H)/I(a-Si:H)/P(a-Si:H)/Al has been prepared. The devices can detect blue and red colors under different bias voltages. The optimization of the device, especially the film thickness and the band gap offset used to achieve better detectivity, is also done in this work. © 2005 Elsevier B.V. All rights reserved.

Amorphous/nanocrystalline silicon p i′ i i′ n devices fabricated on micromachined glass substrates are integrated with oligonucleotide-derivatized gold nanoparticles for a colorimetric detection method. The method enables the specific detection and quantification of unamplified nucleic acid sequences (DNA and RNA) without the need to functionalize the glass surface, allowing for resolution of single nucleotide differences between DNA and RNA sequences-single nucleotide polymorphism and mutation detection. The detector's substrate is glass and the sample is directly applied on the back side of the biosensor, ensuring a direct optical coupling of the assays with a concomitant maximum photon capture and the possibility to reuse the sensor. © 2007 American Institute of Physics.

This paper presents analog building blocks that find potential applications in display panels. A buffer (source-follower), subtractor, adder, and high-gain amplifier, employing only n-type enhancement amorphous gallium-indium-zinc-oxide thin-film transistors (a-GIZO TFTs), were designed, simulated, fabricated, and characterized. Circuit simulations were carried out using a neural model developed in-house from the measured characteristics of the transistors. The adder-subtractor circuit presents a power consumption of 0.26 mW, and the amplifier presents a gain of 34 dB and a power consumption of 0.576 mW, with a load of 10 MΩ16 pF. To the authors' knowledge, this is the highest gain reported so far for a single-stage amplifier with a-GIZO TFT technology. © 2015 IEEE.

The influence of different transparent conducting oxides (TCO) on the transverse photoelectrical properties of one-dimensional position sensitive detectors based on p-i-n amorphous silicon structures was studied. For both SnO 2 and indium tin oxide, poor quality of the p layer was revealed by secondary ion mass spectroscopy measurements. Good agreement between experimental and simulation characteristics of TCO/p-i-n structure was additionally conditioned by a strong increase in defect states at the p layer surface which can be attributed to the reduction/ oxidation process at the TCO/p interface. However, the analysis showed that under reverse bias the spectral response of the p-i-n structure is not significantly affected by different TCO layers and conditions at the TCO/p heterojunction. Nevertheless, indium tin oxide is less appropriate for a front TCO layer due to the poor reverse dark current-voltage characteristic, i.e., higher leakage current component leading to lower signal to noise ratio. © 1997 American Institute of Physics.

In this paper we present results of PIN single and dual axis Thin Film Position Sensitive Detectors (TFPSD) based on hydrogenated amorphous silicon (a-Si:H) technology, with a wide detection area (up to 80 × 80 mm). These sensors provide an alternative to Charge Coupled Devices (CCDs) when large inspection areas are needed, under a requirement to use simpler technology. In this paper we analyse the forward and reverse I-V characteristics in the dark and under illumination, as well as the device linearity of TFPSD. © 1994.

Thick films of cordierite-based glass ceramics were prepared by aqueous tape casting from suspensions containing 80-wt% solids. The weight proportions of cordierite/glass ranged from 70/30 to 30/70 in order to investigate the effect of glass content on the rheological behaviour and on the microstructures and properties of the green tapes. Suspensions with 50 to 60-wt% glass content exhibited the lowest viscosity values among all the slurries investigated, while the green tape containing 30-wt% glass presented homogenous microstructures at both top and bottom surfaces, contrarily to the observations for the other compositions. The green densities increased with glass content. The sintered tapes (1150°C, 2h) containing 50 to 60-wt% glass exhibited the lowest values for the dielectric constant (∼5.2) and dielectric loss (∼0.002) at 1MHz.

This work reports a technique to obtain electronic grade intrinsic amorphous silicon using the plasma enhanced chemical vapour deposition technique at 13.56 MHz. The batch processing method consists of igniting the plasma process through a neutral gas such as hydrogen or helium and only feeding the carrier gas containing the species to be decomposed into the reactor when the plasma is stabilized. By doing so, no surface damage is induced in the first deposited layers and so a more compacted and stable film is produced, compared to amorphous films grown by conventional methods. The best deposition conditions to produce films with good transport properties for optoelectronic applications are: temperature ≈ 473 K, 60 < pressure 87 Pa, power density of 32 mW/cm2 and flow of silane ≈ 10 sccm. The growth rate and the microstructure factor are 1.5 Å/s and 3.3×10-2, respectively, while the activation energy ≈ 0.8 eV; dark conductivity at room temperature ≈ 4.37×10-10 (ωcm)-1; photosensiti-vity ≈ 5.02×l06; density of states ≈ 6.6×1015 cm-3; bonded hydrogen concentration ≈ 20 at% and optical band gap ≈ 1.75 eV.

We have projected and fabricated a microfluidic platform for DNA sensing that makes use of an optical colorimetric detection method based on gold nanoparticles. The platform was fabricated using replica moulding technology in PDMS patterned by high-aspect-ratio SU-8 moulds. Biochips of various geometries were tested and evaluated in order to find out the most efficient architecture, and the rational for design, microfabrication and detection performance is presented. The best biochip configuration has been successfully applied to the DNA detection of Mycobacterium tuberculosis using only 3. l on DNA solution (i.e. 90. ng of target DNA), therefore a 20-fold reduction of reagents volume is obtained when compared with the actual state of the art. © 2013 Elsevier B.V.

The intense light scattered from metal nanoparticles sustaining surface plasmons makes them attractive for light trapping in photovoltaic applications. However, a strong resonant response from nanoparticle ensembles can only be obtained if the particles have monodisperse physical properties. Presently, the chemical synthesis of colloidal nanoparticles is the method that produces the highest monodispersion in geometry and material quality, with the added benefits of being low-temperature, low-cost, easily scalable and of allowing control of the surface coverage of the deposited particles. In this paper, novel plasmonic back-reflector structures were developed using spherical gold colloids with appropriate dimensions for pronounced far-field scattering. The plasmonic back reflectors are incorporated in the rear contact of thin film n-i-p nanocrystalline silicon solar cells to boost their photocurrent generation via optical path length enhancement inside the silicon layer. The quantum efficiency spectra of the devices revealed a remarkable broadband enhancement, resulting from both light scattering from the metal nanoparticles and improved light incoupling caused by the hemispherical corrugations at the cells' front surface formed from the deposition of material over the spherically shaped colloids. © 2015 IOP Publishing Ltd.

Indium doped, and undoped, zinc oxide films were deposited using aerosol assisted chemical vapour deposition (AACVD) at atmospheric pressure on glass substrates. Electrical measurements (I-V) showed a reduction in resistivity following the addition of indium, and XRD analysis revealed an associated switch to c-axis preferred crystal orientation. The ability of the films to oxidise organic material on their surface was analysed using stearic acid as the model contaminant under ultra-violet (UV, 365 nm) irradiation. The In-doped films displayed a greater rate of organic decomposition, which we attribute to the formation of a platelet surface structure having a larger surface area than the undoped films, on which the UV generated electrons and holes may react to form active photocatalytic species. In addition we suggest that the switch to c-axis crystal orientation may reduce the electron-hole pair recombination rate at the grain boundaries, due to an improvement in crystallinity and related reduction in carrier scattering losses, leading to an increase in photocatalytic organic decomposition rate. © 2011 Elsevier B.V. All rights reserved.

The increasing demand in automation processes in finishing techniques also calls for automatic measurement and inspection methods. These methods ought to be installed as close as possible to the production process and they ought to measure the values needed in a safe and fast way, without disturbing the process itself. Simultaneously they should be free of wear and insensitive against mechanical perturbations. This approach can be reached by proper combination of the laser triangulation technique with an array of linear position sensitive detectors, able to supply information about the surface finishing of an object. This is the aim of this paper that envisages to present experimental results of the performances exhibited by such an array constituting 128 elements. The analogue information supplied by this array is processed by an analogue/digital converter, directly coupled to the array and whose information is computer processed, concerning the recognition of patterns and the processing of information collected over the object to be inspected. © 1999 Elsevier Science S.A. All rights reserved.

We report, for the first time, results on transparent ZnO:Al thin films deposited on polyester (Mylar type D, 100 μm thickness) substrates at room temperature by magnetron sputtering. The structural, optical and electrical properties of the deposited films have been studied. The samples are polycrystalline with a hexagonal wurtzite structure and a strong crystallographic c-axis orientation (0 0 2) perpendicular to the substrate surface. The ZnO:Al thin films with 83% transmittance in the visible region and a resistivity as low as 3.6 × 10-2 Ωcm have been obtained, as deposited. The obtained results are comparable to those obtained on glass substrates, opening a new field of low cost, light weight, small volume, flexible and unbreakable large area optoelectronic devices. © 2002 Elsevier Science Ltd. All rights reserved.

Amorphous silicon carbide films were obtained by plasma enhanced chemical vapor deposition (PECVD) technique using a gas mixture of silane, methane, and hydrogen with a high excitation frequency and a high hydrogen dilution ratio. The high temperature annealing behavior of the amorphous silicon carbide films was studied by annealing at 1373 K for 1 h in nitrogen atmosphere. A very thin Au film was deposited on part of the films to investigate the metal induced crystallization effect. Well aligned nanotubes were found on the silicon carbide films covered by a thin gold layer after the high temperature annealing by atomic force microscopy. Further study is necessary to identify the nature of the nanotubes and elucidate their growth mechanism. © 2006 Elsevier B.V. All rights reserved.

Nanotechnology is having a positive impact on nearly every industry, and in particular in healthcare, where it is extending the limits of molecular diagnostics to the nanoscale-nanodiagnostics. Here we describe an innovative optoelectronic platform for the colorimetric detection of nucleic acids based on oligonucleotide-derivatized gold nanoparticles. The device integrates an amorphous/nanocrystalline biosensor and a light emission source with a gold nanoprobe for specific DNA detection. This low cost, fast and simple optoelectronic platform permits detection of few picomole of nucleic acid without target or signal amplification making it suitable for application in population diagnostics and in point-of-care hand-held devices. © 2007 Elsevier B.V. All rights reserved.

Polymorphous silicon (pm-Si:H) films have been prepared by a new regime of plasma enhanced chemical vapour deposition in the region adjacent of phase transition from amorphous to microcrystalline state. Comparing to the conventional amorphous silicon (a-Si:H), the pm-Si:H has higher photoconductivity (σph), better stability, and a broader light spectral response range in the longer wavelength range. It can be found from Raman spectra that there is a notable improvement in the medium range order. There are a blue shift for the stretching mode of IR. spectra and a red shift for the wagging mode. The shifts are attributed to the variation of the microstructure. By using pm-Si:H film as intrinsic layer, a p-i-n junction solar cell was prepared with the initial efficiency of 8.51% and a stabilized efficiency of 8.01% (AM1.5, 100mw/cm2) at room temperature (T R).

A series of hydrogenated amorphous silicon carbide (a-Si 1- xC x:H) films were prepared by plasma-enhanced chemical vapour deposition (PECVD) using a gas mixture of silane, methane, and hydrogen as the reactive source. The previous results show that a high excitation frequency, together with a high hydrogen dilution ratio of the reactive gases, allow an easier incorporation of the carbon atoms into the silicon-rich a-Si 1-xC x:H film, widen the valence controllability. The data show that films with optical gaps ranging from about 1.9 to 3.6 eV could be produced. In this work the influence of the hydrogen dilution ratio of the reactive gases on the a-Si 1-xC x:H film properties was investigated. The microstuctural and photoelectronic properties of the silicon carbide films were characterized by Rutherford backscattering spectrometry (RBS), elastic recoil detection analysis (ERDA), and FT-IR spectrometry. The results show that a higher hydrogen dilution ratio enhances the incorporation of silicon atoms in the amorphous carbon matrix for carbon-rich a-Si 1-xC x:H films. One pin structure was prepared by using the a-Si 1-xC x:H film as the intrinsic layer. The light spectral response shows that this structure fits the requirement for the top junction of colour sensor. © 2004 Elsevier B.V. All rights reserved.

A series of hydrogenated amorphous silicon carbide films were prepared by plasma enhanced chemical vapor deposition (PECVD) using a gas mixture of silane, methane, and hydrogen as the reactive source and an excitation frequency of 27.12 MHz. Compared to the typical radio frequency deposition technique, the very high plasma excitation frequency increases the density of the electrons and decreases the electron temperature, which helps the dissociation of the SiH4 and CH4, and reduces the energetic ion impact on the growth surface of the thin film. Thus, dense-films with lower bulk density of states and higher growth rate are expected, as confirmed by spectroscopic ellipsometry data. Apart from that, a substantial reduction of bulk defects is achieved, allowing an improvement of the valence controllability (widening of the optical gap from about 1.9 to 3.6 eV). In this work results concerning the microstuctural and photoelectronic properties of the silicon carbide films will be discussed in detail, correlating them with the deposition process conditions used as well as with the gas phase composition of the mixtures used. © 2004 Elsevier B.V. All rights reserved.

The aim of this paper is to compare the density of bulk states (DOS) of polymorphous silicon (pm-Si:H) films produced by plasma enhanced chemical vapor deposition at 13.56 and 27.12 MHz using the constant photocurrent method and the space charge limited current (SCLC) technique. The data achieved revealed that the set of films produced present similar DOS. Apart from that, data concerning the correlation of the deposition conditions that lead to the production of pm-Si:H as well as their characteristics, such as the hydrogen content and how hydrogen is bonded, will be discussed, giving special emphasis to the set of mechanical stresses developed. By doing so we could get a better understanding of the nature of hydrogen bonding in pm-Si:H films as well as to determine the role of the excitation frequency on the film's performances, where films with amounts of hydrogen around 20 at.% can have DOS as low as 8 × 10 14 cm-3 with Urbach energies in the range of 41-50 meV. © 2004 Elsevier B.V. All rights reserved.

The present work reports charging effects and surface potential variations in pure copper, cuprous oxide and cupric oxide nanowires observed by electrostatic force microscopy (EFM) and Kelvin probe force microscopy (KPFM). The copper nanowires were produced by wet synthesis, oxidation into cuprous oxide nanowires was achieved through microwave irradiation and cupric oxide nanowires were obtained via furnace annealing in atmospheric conditions. Structural characterization of the nanowires was carried out by X-ray diffraction, scanning electron microscopy, transmission electron microscopy and energy dispersive X-ray spectroscopy. During the EFM experiments the electrostatic field of the positive probe charged negatively the Cu-based nanowires, which in turn polarized the SiO2 dielectric substrate. Both the probe/nanowire capacitance as well as the substrate polarization increased with the applied bias. Cu2O and CuO nanowires behaved distinctively during the EFM measurements in accordance with their band gap energies. The work functions (WF) of the Cu-based nanowires, obtained by KPFM measurements, yielded WFCuO > WFCu > WFCu2O. © 2015 Elsevier B.V.