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Wang, J.a, Elamurugu Barradas Alves Rego Gonçalves Martins Fortunato E. a N. P. "Co-doping of aluminium and gallium with nitrogen in ZnO films deposited by RF magnetron sputtering." Journal of Physics Condensed Matter. 20 (2008). AbstractWebsite

N, (N+Ga) and (N+Al) doped ZnO films were deposited on c-plane sapphire substrates by RF magnetron sputtering at room temperature. The samples were characterized by their structural, surface morphological, compositional and optical properties. The x-ray diffraction studies confirmed the co-doping of (N+Ga) and (N+Al) besides showing improvement in the crystallinity when compared with the single Ndoping. The surface of the films becomes rougher after co-doping. The x-ray photoelectron spectroscopy and Rutherford back-scattering analysis indicate that the co-doping changes the chemical states and varies the amount of nitrogen (N) in ZnO. The amount of 'N' has been greatly increased for (N+Ga) co-doping, indicating that it is the best co-doping pair for p-type ZnO. Additionally, co-doping has increased the average visible transmittance (40-650nm) and the optical band gap is shifted towards shorter wavelength. In the case of (N+Al) co-doping, the band gap becomes wider than that of undoped ZnO. © IOP Publishing Ltd.

Wang, J.a b, Li Sallet Rego Martins Fortunato M. a V. c. "Properties of P-doped ZnO films RF-sputtered at different substrate temperature." Hongwai yu Jiguang Gongcheng/Infrared and Laser Engineering. 40 (2011): 1490-1494. AbstractWebsite

In order to study the properties of P-doped ZnO films deposited at low temperature substrates, P-doped ZnO films were RF-sputtered on sapphire substrates in the range from RT to 350°C. XRD spectra indicated the growth of the crystallites along the strongest <001> orientation. Further ZnO (002) peak became the weakest when the film was sputtered at 250°C. AFM pictures showed that the surface morphology varied with the deposition temperature. The sample RMS increased with the increase of substrate temperature. XPS spectra showed a clear broad P 2p peak at about 134 eV. Further the film composition varied with the substrate temperature. The average visible transmittance calculated in the wavelength ranging 400-600 nm was more than 60%. The optical band gap calculated from the absorption coefficient was about 3.2 eV. The Hall measurements confirm the n-type conductivity of the films. The carrier concentration in the films decreases with the increase of substrate temperature. The study is helpful for understanding the properties of P-doped ZnO films sputtered at lower substrate temperature and achieving p type ZnO films at lower temperature.

Wang, J.a, Elamurugu Sallet Jomard Lusson Rego Barquinha Gonçalves Martins Fortunato E. a V. b. "Effect of annealing on the properties of N-doped ZnO films deposited by RF magnetron sputtering." Applied Surface Science. 254 (2008): 7178-7182. AbstractWebsite

N-doped ZnO films were deposited by RF magnetron sputtering in N2/Ar gas mixture and were post-annealed at different temperatures (Ta) ranging from 400 to 800 °C in O2 gas at atmospheric pressure. The as-deposited and post-annealed films were characterized by their structural (XRD), compositional (SIMS, XPS), optical (UV-vis-NIR spectrometry), electrical (Hall measurements), and optoelectronic properties (PL spectra). The XRD results authenticate the improvement of crystallinity following post-annealing. The weak intensity of the (0 0 2) reflection obtained for the as-deposited N-doped ZnO films was increased with the increasing Ta to become the preferred orientation at higher Ta (800 °C). The amount of N-concentration and the chemical states of N element in ZnO films were changed with the Ta, especially above 400 °C. The average visible transmittance (400-800 nm) of the as-deposited films (26%) was increased with the increasing Ta to reach a maximum of 75% at 600 °C but then decreased. In the PL spectra, A0X emission at 3.321 eV was observed for Ta = 400 °C besides the main D0X emission. The intensity of the A0X emission was decreased with the increasing Ta whereas D0X emission became sharper and more optical emission centers were observed when Ta is increased above 400 °C. © 2008 Elsevier B.V. All rights reserved.

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b Vieira, M.a, Fantoni Koynov Cruz Maçarico Martins A. a S. a. "Amorphous and microcrystalline silicon p-i-n optical speed sensors based on the flying spot technique." Journal of Non-Crystalline Solids. 198-200 (1996): 1193-1197. AbstractWebsite

From the flying spot technique (FST) the ambipolar diffusion length and the effective-lifetime of the carriers photogenerated by a moving light spot that strikes a p-i-n junction can be inferred. In this paper, those properties of a p-i-n junction are used together with an optical triangulation principle to determine the velocity of an object that is moving in the direction of a light source. The light reflected back from the object is analysed through an amorphous or a microcrystalline p-i-n structure. Its transient transverse photovoltage is dependent on the velocity of the object. A comparison between the performances of both kinds of devices is presented.

Vieira, M., Fortunato Lavareda Carvalho Martins E. G. C. "Light and temperature effect on pin a-Si: H device performance." Vacuum. 45 (1994): 1147-1149. AbstractWebsite

We report experimental data on light soaking of a-Si: H solar cells as well as the role played by the temperature on the metastable light-induced defect growth. We studied the temperature and intensity dependence on the photoconductivity, μτ product and density of states at the Fermi level (g(Ef)) and we found that the rate of defect growth on the i-layer depends on the quality of the material and on the annealing temperature, resulting from an equilibrium between light-induced and light-annealed defects. The photoresponse of the devices is mainly ruled by its microstructure, and depends on the fraction of hydrogen bounded on internal surfaces. Results suggest a correlation between the decrease of μτ product for electron and the increase of the fraction of hydrogen bonded on internal surfaces, suggesting structural changes during the degradation process. Data show, also, that the thermal annealing effect is worthless up to 70°C because of light-induced defect-generation being the dominant process in recombination mechanisms. © 1994.

Vieira, M., Fantoni Macarico Soares Martins A. A. F. "a-Si:H optical speed detector based on the flying spot technique." Conference Record of the IEEE Photovoltaic Specialists Conference. Vol. 1. 1994. 571-574. Abstract

We have developed in the past a transient technique called Flying Spot Technique (FST)[1], based on the lateral photoeffect. It allows to determine the ambipolar diffusion length and the effective lifetime of the photogenerated carriers, once the light spot velocity and geometry of the structure are known. We propose to apply this technique backwards in order to detect the path and velocity of an object that is moving toward a light source direction. The light back reflected is analyzed by a p.i.n structure measuring the transient transverse photovoltage which is dependent on the object movement (position and velocity). Details concerning material characterization and device geometry will be presented.

Vieira, M., Martins Fortunato Soares Guimarães R. E. F. "A-Si:H ambipolar diffusion length and effective lifetime measured by flying spot (FST) and spectral photovoltage (SPT) techniques." Journal of Non-Crystalline Solids. 137-138 (1991): 479-482. AbstractWebsite

On this paper we report the physical model that supports the theory of the Flying Spot Technique (FST). Through this technique it is possible to determine separately the ambipolar diffusion length (L*) and the effective lifetime (τ*) of the generated carriers, using either Schottky diodes or quasi-ohmic sandwich structures. We also report a new static method based on the Spectral Photovoltage (SPT) that allows to infer the ambipolar diffusion length and to estimate the surface recombination velocity. © 1991 Elsevier Science Publishers B.V. All rights reserved.

Vieira, Manuela, Fantoni Alessandro Macarico A.Felipe Soares Fernando Martins Rodrigo. "Hydrogenated amorphous silicon speed sensor based on the flying spot technique." Proceedings of SPIE - The International Society for Optical Engineering. Vol. 2397. 1995. 683-694. Abstract

PIN devices based on hydrogenated amorphous silicon (a-Si:H) became fundamental elements of many different types sensors, based on either the transverse or the lateral photovoltaic effect. In the past we have developed a transient technique, called the Flying Spot Technique (FST), based on the lateral photoeffect. FST allows, not only to infer the ambipolar diffusion length but also the effective lifetime of the photogenerated carriers once the light spot velocity and geometry of the structure were known. In this paper we propose to apply this technique backwards in order to detect the path and velocity of an object that is moving in a light source direction. The light reflected back from the object is analyzed through p.i.n. structure being the transient transverse photovoltage dependent on the object movement (position and velocity). Assuming known the transport properties of the material and the geometry of the device and using a triangulation method we show that it is possible to map the object movement. Details concerning material characterization, simulation and device geometry are presented.

Vieira, M., Fortunato Carvalho Lavareda Martins E. C. G. "Influence of photodegradation on the υτ and microstructure of pin a-Si:H devices." Vacuum. 45 (1994): 1109-1111. AbstractWebsite

Pin solar cells of a-Si:H were light soaked. The cell characteristics, the optoelectronic properties and the microstructure parameter, as well as the hydrogen content and density of states of the i-layer, were monitored throughout the entire light-induced degradation process and compared with the corresponding μτ product (for both carriers) inferred through steady photoconductivity and FST measurements. Results suggest a correlation between the decrease of μτ product for electrons and the increase of the fraction of hydrogen bonded on internal surfaces, showing structural changes during the degradation process. © 1994.

Vieira, M., Fantoni Martins Koynov Wang Grebner Schwarz A. R. S. "Comparison of diffusion length measurements from the flying spot technique and the photocarrier grating method in amorphous thin films." Conference Record of the IEEE Photovoltaic Specialists Conference. Vol. 1. 1994. 575-578. Abstract

Using the Flying Spot Technique (FST) we have studied minority carrier transport parallel and perpendicular to the surface of amorphous silicon films (a-Si:H). To reduce slow transients due to charge redistribution in low resistivity regions during the measurement we have applied a strong homogeneously absorbed bias light. The defect density was estimated from CPM measurements. The steady-state photocarrier grating technique (SSPG) is a 1-dimensional approach. However, the modulation depth of the carrier profile is also dependent on film surface properties, like surface recombination velocity. Both methods yield comparable diffusion lengths when applied to a-Si:H.

Vieira, M., Fantoni Fortunato Lavareda Martins A. E. G. "AD-layer for spatial control of light induced degradation on pin devices." Materials Research Society Symposium Proceedings. Vol. 336. 1994. 741-746. Abstract

In this work we report experimental results on light induced metastability of a-Si: H p.i.n. devices with different microscopic/macroscopic structures and we discuss them in terms of improved stability through spatial control of charged defects grown during light exposure. By placing a thin (few A) intrinsic layer (i) between both p/i and i/n a-Si: H interfaces we are able to reduce the effective degradation rate through spatial modification of the electric field profile in the device. The electronic transport and the stability changes that accompany the change in microstructure (R) and hydrogen content (CH) of the i- and i′-layer, were monitored throughout the entire light induced degradation process and compared with the corresponding μT product (for both carriers) inferred through steady state photoconductivity and Flying Spot Technique (FST) measurements. Results show that the degradation rate is a function of CH and R of both layers and can be correlated with the density of microvoids and di-hydride bonding. Since the i′-layers have a higher CH bonded mainly as SiF2 radicals (R≈0.4), they act as an hindrance to the growth of the defect, in the active region, generating "gettering centers" whose localisation and density are tailored in such a way that they will control spatially the electric field profile during light exposure. Preliminary results show improvements in film's stability when the interfacial layer is included. So future progress toward more stable and efficient a-Si: H solar cells will depend on a careful engineering design of the devices. © 1994 Materials Research Society.

Vieira, M., Fortunato Lavareda Carvalho Martins E. G. C. "Role of photodegradation on the μτ product and microstructure of the a-Si:H pin devices." Materials Research Society Symposium Proceedings. Vol. 297. 1993. 637-642. Abstract

PIN solar cells were light soaked up to 60 hours. The cell characteristics, the optoelectronic properties and the microstructure parameter (R = I2100/I2100+I2000) as well as the hydrogen content (CH) and density of states (g(Ef)) of the active i-layer were monitored throughout the entire light induced degradation process and compared with the correspondents μτ product (for both carriers) inferred through steady photoconductivity and FST measurements. Data show a strong correlation between the decrease of μτ product for electron and the increase of the fraction of hydrogen bonded on internal surfaces (R increases from 0.1 to 0.4) suggesting structural changes during the light induced defects' formation. For holes, the μτ product remains approximately constant and only dependent on the initial hydrogen content. As g(Ef) increases, μτ presents an asymmetrical decrease showing that electrons are more sensitive to defects' growth than holes. We also observe that the rate of degradation is faster for samples having the lowest defect densities, R and CH, showing that the amount of degradation is not a simple function of the photon exposure (Gt product) but also depends on the material microstructure.

Vieira, M., Fantoni Macarico Soares Evans Martins A. A. F. "Hydrogenated amorphous silicon speed sensor based on the flying spot technique." Materials Research Society Symposium - Proceedings. Vol. 377. 1995. 839-844. Abstract

In the past we have developed a transient technique, called the Flying Spot Technique (FST). FST allows, not only to infer the ambipolar diffusion length but also the effective lifetime of the photogenerated carriers once the light spot velocity and geometry of the structure were known. In this paper, we propose to apply this technique backwards in order to detect the path and velocity of an object that is moving in the direction of a light source. The light reflected back from the object is analyzed through a p.i.n structure being the transient transverse photovoltage dependent on the movement of the object (position and velocity). Assuming that the transport properties of the material and the geometry of the device are known and using a triangulation method we show that it is possible to map the movement of the object. Details concerning material characterization, simulation and device geometry are presented.

Vicente, A.a, Águas Mateus Araújo Lyubchyk Siitonen Fortunato Martins H. a T. a. "Solar cells for self-sustainable intelligent packaging." Journal of Materials Chemistry A. 3 (2015): 13226-13236. AbstractWebsite

Nowadays there is a strong demand for intelligent packaging to provide comfort, welfare and security to owners, vendors and consumers by allowing them to know the contents and interact with the goods. This is of particular relevance for low cost, fully disposable and recyclable products, such as identification tags and medical diagnostic tests, and devices for analysis and/or quality control in food and pharmaceutical industries. However, the increase of complexity and processing capacity requires continuous power and can be addressed by the combined use of a small disposable battery, charged by a disposable solar cell, which is able to work under indoor lighting. Herein, we show a proof-of-concept of the pioneering production of thin-film amorphous silicon (a-Si:H) solar cells with an efficiency of 4% by plasma enhanced chemical vapour deposition (PECVD) on liquid packaging cardboard (LPC), which is commonly used in the food and beverage industries. Such accomplishment put us one step closer to this revolution by providing a flexible, renewable and extremely cheap autonomous energy packaging system. Moreover, such Si thin films take advantage of their good performance at low-light levels, which also makes them highly desirable for cheap mobile indoor applications. © The Royal Society of Chemistry.

Veigas, B.a b, Jacob Costa Santos Viveiros Inácio Martins Barquinha Fortunato Baptista J. M. b M. "Gold on paper-paper platform for Au-nanoprobe TB detection." Lab on a Chip - Miniaturisation for Chemistry and Biology. 12 (2012): 4802-4808. AbstractWebsite

Tuberculosis (TB) remains one of the most serious infectious diseases in the world and the rate of new cases continues to increase. The development of cheap and simple methodologies capable of identifying TB causing agents belonging to the Mycobacterium tuberculosis Complex (MTBC), at point-of-need, in particular in resource-poor countries where the main TB epidemics are observed, is of paramount relevance for the timely and effective diagnosis and management of patients. TB molecular diagnostics, aimed at reducing the time of laboratory diagnostics from weeks to days, still require specialised technical personnel and labour intensive methods. Recent nanotechnology-based systems have been proposed to circumvent these limitations. Here, we report on a paper-based platform capable of integrating a previously developed Au-nanoprobe based MTBC detection assay - we call it "Gold on Paper". The Au-nanoprobe assay is processed and developed on a wax-printed microplate paper platform, allowing unequivocal identification of MTBC members and can be performed without specialised laboratory equipment. Upon integration of this Au-nanoprobe colorimetric assay onto the 384-microplate, differential colour scrutiny may be captured and analysed with a generic "smartphone" device. This strategy uses the mobile device to digitalise the intensity of the colour associated with each colorimetric assay, perform a Red Green Blue (RGB) analysis and transfer relevant information to an off-site lab, thus allowing for efficient diagnostics. Integration of the GPS location metadata of every test image may add a new dimension of information, allowing for real-time epidemiologic data on MTBC identification. © 2012 The Royal Society of Chemistry.

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Ullaha, S.a, De Matteis Branquinho Fortunato Martins Davoli F. a R. b. "A combination of solution synthesis & solution combustion synthesis for highly conducting and transparent Aluminum Zinc Oxide thin films." IEEE-NANO 2015 - 15th International Conference on Nanotechnology. 2015. 144-147. Abstract

Aluminum Zinc Oxide has been extensively investigated as a cheap alternative to transparent conducting tin oxide films for electronic and optoelectronic applications. Thin films of Aluminum Zinc Oxide have been developed successfully through a combination of solution combustion synthesis and solution synthesis. Zn(NO3)3·6H2O as metal source was dissolved in 2-methoxyethanol as solvent through combustion synthesis with Urea as fuel while dopant source of AlCl3·6H2O was mixed separately in solvent to avoid aluminum oxide formation in the films. Precursor solutions were obtained mixing Zn & Al separate solutions in 9:1, 8:2, and 7:3 ratios respectively with oxide, fuel and dopant concentrations of 0.5, 0.25, 0.1, and 0.05 M. The film stacks have been prepared through spin-coating with heating at 400°C for 10 minutes after each deposition to remove residuals and evaporate solvents. Thermal annealing in oven at 600°C for 1 hour followed by rapid thermal annealing at 500°C & 600°C first in vacuum and then in N2-5%H2 environment respectively for 10 minutes each reduced the resistivity of film stacks. Film stack with 10 layers for an average thickness of 0.5μm gave the best Hall Effect resistivity of 3.2 × 10-2 -cm in the case of 0.5M solution with Zn:Al mixing ratio of 9:1 for RTA annealings at 600°C with an average total transparency of 80 % in the wavelength range of 400-1200 nm. The results show a clear trend that increasing the amount of ingredients resistivity could further be decreased. © 2015 IEEE.

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Topic, M., Smole Furlan Fortunato Martins F. J. E. "Examination of 1-D position sensitive detector performance through analysis of front contact heterojunction." Materials Research Society Symposium - Proceedings. Vol. 420. 1996. 171-176. Abstract

The influence of different TCOs (SnO2 and ITO) on the photoelectrical properties of 1-D position sensitive detectors based on p-i-n structures was studied. A strong cross-contamination in the p-layer and contamination in the i-layer reduce the quality of the device. Numerical analysis of TCO/p-i-n structure also revealed a strong increase in defect states at the p-layer surface which can be attributed to the reduction of TCO. ITO seems to be less appropriate for a front TCO, although the spectral response of the p-i-n structure under reverse bias is not significantly affected by the conditions at the TCO/p heterojunction.

Topič, M.a, Smole Furlan Fortunato Martins F. a J. a. "Analysis of front contact heterojunction in a-Si:H one-dimensional position sensitive detectors." Review of Scientific Instruments. 68 (1997): 1377-1381. AbstractWebsite

The influence of different transparent conducting oxides (TCO) on the transverse photoelectrical properties of one-dimensional position sensitive detectors based on p-i-n amorphous silicon structures was studied. For both SnO 2 and indium tin oxide, poor quality of the p layer was revealed by secondary ion mass spectroscopy measurements. Good agreement between experimental and simulation characteristics of TCO/p-i-n structure was additionally conditioned by a strong increase in defect states at the p layer surface which can be attributed to the reduction/ oxidation process at the TCO/p interface. However, the analysis showed that under reverse bias the spectral response of the p-i-n structure is not significantly affected by different TCO layers and conditions at the TCO/p heterojunction. Nevertheless, indium tin oxide is less appropriate for a front TCO layer due to the poor reverse dark current-voltage characteristic, i.e., higher leakage current component leading to lower signal to noise ratio. © 1997 American Institute of Physics.

d Teixeira, V.a, Cui Meng Fortunato Martins H. N. a L. "Amorphous ITO thin films prepared by DC sputtering for electrochromic applications." Thin Solid Films. 420-421 (2002): 70-75. AbstractWebsite

Indium-Tin-Oxide (ITO) thin films were deposited on glass substrates using DC magnetron reactive sputtering at different bias voltages and substrate temperatures. Some improvements were obtained on film properties, microstructure and other physical characteristics for different conditions. Amorphous and polycrystalline films can be obtained for various deposition conditions. The transmission, absorption, spectral and diffuse reflection of ITO films were measured in some ranges of UV-Vis-NIR. The refractive index (n), Energy band gap Eg and the surface roughness of the film were derived from the measured spectra data. The carrier density (nc) and the carrier mobility (μ) of the film micro conductive properties were discussed. The films exhibited suitable optical transmittance and conductivity for electrochromic applications. © 2002 Elsevier Science B.V. All rights reserved.

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Silva, L.B.a, Baptista Raniero Doria Franco Martins Fortunato P. b L. c. "Novel Optoelectronic platform using an amorphous/nanocrystalline Silicon biosensor for the specific identification of unamplified nucleic Acid sequences based on gold nanoparticle probes." TRANSDUCERS and EUROSENSORS '07 - 4th International Conference on Solid-State Sensors, Actuators and Microsystems. 2007. 935-938. Abstract

Here we describe an innovative optoelectronic platform which enables the specific detection of unamplified nucleic acid sequences with the integration of oligonucleotide-derivatized gold nanoparticles, a colour sensor and a light emission source for a colorimetric detection method. This new low cost, fast and simple optoelectronic platform permits detection of less than 1 picomole quantities of nucleic acid without target or signal amplification. ©2007 IEEE.

Silva, L.B.a, Baptista Raniero Doria Martins Fortunato P. b L. c. "Characterization of optoelectronic platform using an amorphous/nanocrystalline silicon biosensor for the specific identification of nucleic acid sequences based on gold nanoparticle probes." Sensors and Actuators, B: Chemical. 132 (2008): 508-511. AbstractWebsite

Nanotechnology is having a positive impact on nearly every industry, and in particular in healthcare, where it is extending the limits of molecular diagnostics to the nanoscale-nanodiagnostics. Here we describe an innovative optoelectronic platform for the colorimetric detection of nucleic acids based on oligonucleotide-derivatized gold nanoparticles. The device integrates an amorphous/nanocrystalline biosensor and a light emission source with a gold nanoprobe for specific DNA detection. This low cost, fast and simple optoelectronic platform permits detection of few picomole of nucleic acid without target or signal amplification making it suitable for application in population diagnostics and in point-of-care hand-held devices. © 2007 Elsevier B.V. All rights reserved.

Silva, L.B.a, Veigas Doria Costa Inácio Martins Fortunato Baptista B. b G. b. "Portable optoelectronic biosensing platform for identification of mycobacteria from the Mycobacterium tuberculosis complex." Biosensors and Bioelectronics. 26 (2011): 2012-2017. AbstractWebsite

In this paper we report on the fabrication and performance of a portable and low cost optoelectronic platform integrating a double color tuned light emitting diode as light source, an amorphous/nanocrystalline silicon photodetector with a flat spectral response in the wavelength range from 520. nm to 630. nm and integrated electronic for signal acquisition and conditioning constituted by current to voltage converter, a filter and an amplification stage, followed by an analog to digital converter, with appropriate software for full automation to minimize human error. Incorporation of the double color tuned light emitting diode provides for a simple yet innovative solution to signal acquisition independently from the light intensity and/or solution concentration, while considerably decreasing production costs. Detection based on Au-nanoprobes constitutes the biorecognition step and allowed identification of specific sequences of Mycobacterium tuberculosis complex, namely Mycobacterium bovis and M. tuberculosis in biological samples. © 2010 Elsevier B.V.

Silva, A., Raniero Ferreira Águas Pereira Fortunato Martins L. E. H. "Silicon etching in CF4/O2 and SF6 atmospheres." Materials Science Forum. 455-456 (2004): 120-123. AbstractWebsite

The aim of this work is to present a process able to allow a fast method to clean plasma enhanced chemical vapour deposition (PECVD) systems used to produce amorphous silicon films and their alloys, and a proper device patterning when required. In this work we propose to study CF4/O2 or SF6 as etchant gases at room temperature to perform cleaning and films patterning. The aim is to select the process that leads to a faster cleaning process without formation of residual contaminants or to anisotropic patterning of very thin layers. The influence of some plasma parameters, such as pressure (p), power (P) and flow (f) for the etchant gases used will be also analysed.

c c Shan, F.a, Liu Liu Meng Fortunato Martins A. a G. a. "Low-voltage high-stability InZnO thin-film transistor using ultra-thin solution-processed ZrOx dielectric." IEEE/OSA Journal of Display Technology. 11 (2015): 541-546. AbstractWebsite

This paper deals with the evaluation of the performances of InZnO thin-film transistor (TFT) using as dielectric an ultra-thin solution-processed ZrOx layer. The ZrOx thin film was formed using ultraviolet (UV) photo-annealing method and shows a low leakage-current density of 4 nA/cm2 at 3.8 MV/cm and a large areal-capacitance of 775 nF/cm2 at 50 Hz. The InZnO TFT incorporating the UV-treated ZrOx dielectric exhibits high stable and enhanced characteristics, an on/off current ratio of 10

Sekhar, M.C.a, Uthanna Martins Chandra Elangovan S. a R. b. "The effect of Substrate temperature on physical and electrical properties of DC magnetron sputtered (Ta 2O 5) 0.85(TiO 2) 0.15 films." IOP Conference Series: Materials Science and Engineering. Vol. 34. 2012. Abstract

Thin films of (Ta 2O 5) 0.85(TiO 2) 0.15 were deposited on quartz and p-Si substrates by DC reactive magnetron sputtering at different substrate temperatures (T s) in the range 303 - 873 K. The films deposited at 303 0K were in the amorphous and it transformed to crystalline at substrate temperatures ≥ 573 0K. The crystallite size was increased from 50 nm to 72 nm with the increase of substrate temperature. The surface morphology was significantly influenced with the substrate temperature. After deposition of the (Ta 2O 5) 0.85(TiO 2) 0.15 films on Si, aluminium (Al) electrode was deposited to fabricate metal/oxide/semiconductor (MOS) capacitors with a configuration of Al/(Ta 2O 5) 0.85(TiO 2) 0.15/Si. A low leakage current of 7.7 × 10 -5 A/cm 2 was obtained from the films deposited at 303 K. The leakage current was decreased to 9.3 × 10 -8 A/cm 2 with the increase of substrate temperature owing to structural changes. The conduction mechanism of the Al/(Ta 2O 5) 0.85(TiO 2) 0.15/Si capacitors was analyzed and compared with mechanisms of Poole-Frenkel and Schottky emissions. The optical band gap (E g) was decreased from 4.45 eV to 4.38 eV with the increase in substrate temperature. © Published under licence by IOP Publishing Ltd.