Moniz, António, and Tiago Machado Novos Modelos de Produção na Indústria Automóvel Algumas Interrogações[New models of production in automotive industry: some questions]. University Library of Munich, Germany, 2001.
AbstractTaking into account the global trends towards vertical de-integration and functional integration, the WorTiS project is expected to be able to determine to what extent the Portuguese automobile industry is experiencing far-reaching changes as far as innovative (post-fordist) work systems are concerned. One of the objectives is to reach wider conclusions regarding the sector under analysis within a new multi-disciplinary approach, in connection with other research networks (namely, GERPISA and IMVP-MIT). It will recover relevant information in automobile companies located in Portugal (like, Toyota, Citröen, FIAT, Renault, Ford, VW, UMM), in order to understand how concrete practices have being developed in time, and update the scientific knowledge with the development of new case studies (Mitsubishi, AutoEuropa, Opel-GM, and other sub-contracting firms). is intended to present a new fieldwork methodology in order to analyse the variety, and contradictory character, of changes in work practices. The analysis would focus on the cases of automotive firms that operated, and are still operating, in Portugal. The effectiveness of such a tool will last far beyond the project itself.
Martins, R., Águas Silva Ferreira Cabrita Fortunato H. V. I. "
Nanostructured silicon films produced by PECVD."
Materials Research Society Symposium - Proceedings. Vol. 664. 2001. A961-A966.
AbstractThis paper presents the process conditions that lead to the production of nanostructured silicon films grown by plasma enhanced chemical vapour deposition close to the so-called gamma regime (powder formation), highly dense and with low density of bulk states. Thus, the powder management is one important issue to be addressed in this paper. As a general rule we observed that high quality films (low density of states and high μτ products) are obtained when films are grown under low ion bombardment at high hydrogen dilution and deposition pressure conditions, to allow the proper surface passivation and surface activation.