New nanostructured silicon films grown by PECVD technique under controlled powder formation conditions | Hugo Águas

New nanostructured silicon films grown by PECVD technique under controlled powder formation conditions

Citation:: Martins, R., H. Aguas, A. Cabrita, P. Tonello, V. Silva, I. Ferreira, E. Fortunato, and L. Guimarães. "New nanostructured silicon films grown by PECVD technique under controlled powder formation conditions." Solar energy. 69 (2001): 263-269.

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