Nanocrystalline p-type silicon films produced by hot wire plasma assisted technique

Citation:
Ferreira, I., Braz F. Fernandes, P. Vilarinho, E. Fortunato, and R. Martins. "Nanocrystalline p-type silicon films produced by hot wire plasma assisted technique." Materials Science and Engineering: C. 15.1 (2001): 137-140.

Abstract:

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Notes:

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