Rodrigo Martins

Results are presented which are geared towards an understanding of the influence of powder formation during film growth. Plasma chemistry is correlated with the morphology, structure (inferred through infrared spectroscopy, scanning electron microscopy and X-ray diffraction) electro-optical and density of states of intrinsic films deposited under continuous and power modulated operation. Results show that for modulation frequencies where no powder formation occurs and low substrate temperatures T (150°C), silane decomposition gives rise to the growth of inhomogeneous films while in the high modulation frequency regime, at the same temperature, the anions and powder are trapped resulting in films with high deposition rates and low defect density.

The special Professor Walter E. Spear commemoration issue of the Philosophical Magazine, published in October 2009, contains papers which cover the numerous relevant issues, driven by commercial applications, primarily solar energy and displays. Kocka reviews the complex microstructure of crystallites embedded in the amorphous silicon tissue, the transport mechanism is determined by the conductive grains and influenced by the passivation through H at the grain boundaries. Hugger and co-researchers report on transient photocapacitance spectroscopy and drive-level capacitance profiling as a way of elucidating the fundamental electronic properties of hydrogenated ncSi. Tawada recounts the history of a-Si:H pin heterojunction solar cells, emphasizing the role of the p-type silicon carbide layer in the improvement of the device. Schubert and colleagues focus their work on the production of flexible PV modules with many applications in the architectural arena or integrated into clothing.

UV-enhanced monocrystalline zinc sulphide optical sensors with high quantum efficiency have been developed by spray deposition of heavy fluorine-doped tin oxide (FTO) thin films onto the surface of zinc sulphide monocrystals as an alternative to the UV-enhanced high-efficiency silicon photodetectors commonly used in precise radiometric and spectroscopic measurements as well as to new sensors based on SiC and GaN. The fabricated sensors have an unbiased internal quantum efficiency that is nearly 100% from 250 to 320 nm, and the typical sensitivity at 250 nm is 0.15 A W-1. The sensors are insensitive to solar radiation in conditions on the earth and can be used as solar blind photodetectors for precision UV measurements under direct solar illumination for both terrestrial and space applications.

We present a set of high-efficiency optical sensors for the spectral range from 0.25 to 1.1 μm based on metal oxide-semiconductor heterostructures using different substrates: GaP, GaSe, AlxGa1-xAs, GaAs and Si. A set of several transparent conductive metal oxide films such as indium, tin and zinc oxides fabricated by the spray pyrolysis method and its doping procedure has been investigated. The results show that heavily doped indium and tin oxide films are preferable as the active transparent conductive electrode in heterojunction surface-barrier structures. The fabricated sensors exhibit several features such as process simplicity, high quantum efficiency, uniformity of sensitivity over the active area and a high response speed. Such sensors can be used for precision measurements in different scientific and technical applications.

We have developed new types of functional and smart optical silicon sensors, based on ITO/multichannel insulator/silicon structures, which are able to execute electronic functions such as amplifying the photocurrent (without avalanche multiplication), transforming the input optical signal into a radio frequency output signal and transforming the analogue input optical signal to a digital output form, without external active electronic components. These new functional optical sensors allow a substantial simplification of the registration of optical signals as well as of the electronic scheme to be used. © 1998 Elsevier Science S.A. All rights reserved.

This work's aim is to report for the first time the cubic to hexagonal phase transition in tin-doped In2O3 films with a Sn/In atomic ratio of 0.03, fabricated at low temperature and normal pressure from alcoholic solution of InCl3 and SnCl4. The performed X-ray diffraction measurements show a difference between crystallographic symmetry of thin (100 nm) and thick (400 nm) films prepared in the same conditions: the structure of thick films can be related to high pressure In2O3 hexagonal system with a preferred orientation of c-axis parallel to the substrate surface, while thin films present a cubic symmetry with columnar (400) grain orientation. Phase transition nature is connected with non-axial tensile deformation of indium oxide grid due to insertion of chlorine ions in the position of two diagonally opposite oxygen vacancies in In2O3 network.

We report the properties and optoelectronic applications of transparent and conductive indium and tin oxide films prepared by the spray pyrolysis method and doped with Sn or F, respectively. The film properties have been measured using X-ray diffraction, optical and electrical absorption. As examples of applications we produced a set of selective optical detectors for different spectral regions, covering the wavelength range from 0.25 to 1.1 μm, based on metal oxide-semiconductor heterostructures and using different substrates such as: GaP, GaSe, AlxGa1-xAs, GaAs and Si. The fabricated devices exhibit several features such as: production simplicity, high quantum efficiency, uniform sensitivity over the entire active area and a high response speed. Finally, we present a high quantum efficiency and solar blind monocrystalline zinc sulphide optical sensor fabricated by spray deposition as an alternative to the ultraviolet-enhanced SiC and GaN photodetectors and the performances of a solar cell. © 1998 Elsevier Science B.V. All rights reserved.

UV-enhanced monocrystalline zinc sulphide optical sensors with high quantum efficiency have been developed by spray deposition of heavy fluorine-doped tin oxide (FTO) thin films onto the surface of zinc sulphide monocrystals as an alternative to the UV-enhanced high-efficiency silicon photodetectors commonly used in precise radiometric and spectroscopic measurements as well as to new sensors based on SiC and GaN. The fabricated sensors have an unbiased internal quantum efficiency that is nearly 100% from 250 to 320 nm, and the typical sensitivity at 250 nm is 0.15 A W-1. The sensors are insensitive to solar radiation in conditions on the earth and can be used as solar blind photodetectors for precision UV measurements under direct solar illumination for both terrestrial and space applications. © 1998 Elsevier Science S.A. All rights reserved.

We present a set of high-efficiency optical sensors for the spectral range from 0.25 to 1.1 μm based on metal oxide-semiconductor heterostructures using different substrates: GaP, GaSe, AlxGa1 - xAs, GaAs and Si. A set of several transparent conductive metal oxide films such as indium, tin and zinc oxides fabricated by the spray pyrolysis method and its doping procedure has been investigated. The results show that heavily doped indium and tin oxide films are preferable as the active transparent conductive electrode in heterojunction surface-barrier structures. The fabricated sensors exhibit several features such as process simplicity, high quantum efficiency, uniformity of sensitivity over the active area and a high response speed. Such sensors can be used for precision measurements in different scientific and technical applications. © 1998 Elsevier Science S.A. All rights reserved.

A new high quantum efficiency gallium phosphide Schottky photodiode has been developed by spray deposition of heavily doped tin oxide films on n-type epitaxial structures, as an alternative to the conventional Schottky photodiodes using a semitransparent gold electrode. It is shown that fluorine-doped tin oxide films are more effective as transparent electrodes than tin-doped indium oxide films. The proposed photodiodes have a typical responsivity near 0.33 A W-1 at 440 nm and an unbiased internal quantum efficiency close to 100%, in the range from 250 to 450 nm. The model used to calculate the internal quantum efficiency (based on the optical constants of tin oxide films and gallium phosphide epitaxial layers) is found to be in good agreement with the experimental results. The data show that the quantum efficiency is strongly dependent on the thickness of the transparent electrode, owing to optical interference effects. The noise equivalent power for 440 nm is 2.7 × 10-15 W Hz-1/2, which indicates that these photodiodes can be used for accurate measurements in the short-wavelength range, even in the presence of stronger infrared background radiation.

We have developed new types of functional and smart optical silicon sensors, based on ITO/multichannel insulator/silicon structures, which are able to execute electronic functions such as amplifying the photocurrent (without avalanche multiplication), transforming the input optical signal into a radio frequency output signal and transforming the analogue input optical signal to a digital output form, without external active electronic components. These new functional optical sensors allow as substantial simplification of the registration of optical signals as well as of the electronic scheme to be used.

This work reports the structure and electro-optical characteristics of different metal oxide films obtained by spray pyrolysis on heated glass substrates, aiming their application in optoelectronic devices. The results show that this technique leads to thin films with properties ranging from dielectric to degenerate semiconductors, offering the following advantages: simplicity, low cost, high productivity and the possibility of covering large areas, highly important for large area device applications.

We present the modelling of a new two-terminal and low-voltage operating optoelectronic device based on MIS silicon structure with multichannel insulator and having as gate a transparent metallic tin-doped indium oxide (ITO) layer deposited by spray pyrolysis technique over the insulator layer. ITO layer has a multiple non-rectifier electrical contact with silicon substrate, in the SiO2 channel's region. Construction details of the process, together with its operating characteristics are given. The devices developed do not require external active electronic components (transistors, microschemes) to execute their functions and to transform analogue input optical signals to digital output form, highly important for a wide range of optoelectronic applications.

High quantum efficiency, UV-enhanced monocrystalline zinc sulphide optical sensors for precise radiometric and spectroscopic measurements have been developed by spray deposition of heavy fluorinedoped tin oxide thin films with carrier concentration near 1021 cm-3 onto the surface of zinc sulphide monocrystals as an alternative to the UV-enhanced silicon photodetectors as well as to new detectors based on SiC and GaN. The fabricated sensors have an unbiased internal quantum efficiency that was nearly 100% from 250 to 320 nm, and the typical sensitivity at 290 nm is 0.15 A/W. The sensors were insensitive to solar radiation in earth's conditions and can be used as solar blind photodetectors for precision UV-measurements under direct solar illumination, both terrestrial and space applications.

In this paper we report the success in fabricating FTO/Si surface-barrier photodiodes produced by spray pyrolysis deposition technique, under ambient conditions. Three types of photodetectors for low-voltage-bias operation were developed based on high-resistivity silicon: 1. X-Ray detectors with energy resolution of 16.5% at 661.5 keV (137Cs source), consisting of surface-barrier PIN photodiode with an active area of 50 mm2 operating at 5 V reverse bias, scintillator based on monocrystalline Bi4Ge3O12 and preamplifier (noise of 250 e- RMS.); 2. Fast-response surface-barrier FTO/n–n+ silicon epitaxial photodiodes, operating at 10 V bias with rise times of 2 ns at λ = 0.85 μm; 3. Radiation-resistant drift epitaxial surface-barrier PIN photodiodes for unbiased operating conditions, with an exponential impurity distribution in a 8 μm thick epitaxial layer. A built-in electrical field due to the carrier concentration distribution in the epitaxial layer provides a considerable improvement in the `critical fluence' value (3×1014 cm-2) for neutron irradiation.

Electrochemically active bacteria (EAB) have the capability to transfer electrons to cell exterior, a feature that is currently explored for important applications in bioremediation and biotechnology fields. However, the number of isolated and characterized EAB species is still very limited regarding their abundance in nature. Colorimetric detection has emerged recently as an attractive mean for fast identification and characterization of analytes based on the use of electrochromic materials. In this work, WO 3 nanoparticles were synthesized by microwave assisted hydrothermal synthesis and used to impregnate non-treated regular office paper substrates. This allowed the production of a paper-based colorimetric sensor able to detect EAB in a simple, rapid, reliable, inexpensive and eco-friendly method. The developed platform was then tested with Geobacter sulfurreducens, as a proof of concept. G. sulfurreducens cells were detected at latent phase with an RGB ratio of 1.10 ± 0.04, and a response time of two hours.

The aim of this work is to present a model to interpret the static and the dynamic detection and resolution limits of 1D thin film position sensitive detectors based on p-i-n a-Si:H devices. The model can determine the device characteristics that influence the spatial limits and the response time of the device.

This paper presents results of the role of the oxygen partial pressure (pO2) used on the properties exhibited by doped μc silicon oxycarbide films produced by a Two Consecutive Decomposition and Deposition Chamber (TCDDC) system [1], where a spatial separation between the plasma and the growth regions is achieved. The films produced are highly conductive and transparent with suitable properties for optoelectronic applications.

We report the architecture and the performances of a memory based on a single field-effect transistor built on paper able to write-erase and read. The device is composed of natural multilayer cellulose fibers that simultaneously act as structural support and gate dielectric; active and passive multicomponent amorphous oxides that work as the channel and gate electrode layers, respectively, complemented by the use of patterned metal layers as source/drain electrodes. The devices exhibit a large counterclockwise hysteresis associated with the memory effect, with a turn-on voltage shift between 1 and -14.5 V, on/off ratio and saturation mobilities of about 104 and 40 cm 2 V-1 s-1, respectively, and estimated charge retention times above 14 000 h. © 2008 American Institute of Physics.

This paper presents data concerning the composition structure and optical characteristics of polymorphous silicon films produced by plasma enhanced chemical vapour deposition at 27.12 MHz and determined respectively by infrared spectrometry, micro Raman, exodiffusion and spectroscopic ellipsometry measurements. When compared to the pm-Si:H films produced at 13.56 MHz, the films produced at 27.12 MHz present hydrogen contents in the range of 21 at%, the sharp peak ascribed to the exodifusion measurements is shifted towards high temperatures and the imaginary part of the dielectric function 〈ε2〉 is larger and shifted to high energies. Apart from that the peaks of the infrared spectra ascribed to the stretching modes shift towards high wave numbers and the half width of the micro Raman peaks shrinks, meaning that the films produced at 27.12 MHz are more compact and dense.

The aim of this paper was to present results of the role of the d.c. grid bias on the silane plasma impedance and its I-V characteristics to grow undoped amorphous silicon (a-Si:H) films by plasma enhanced chemical vapour deposition (PECVD) in conditions where some nanoparticles can be formed in the growth region of the deposition process, under proper ion bombardment. The results achieved show that the performances of the films produced are dependent on the self bias voltage that can present photosensitivities of approximately 107 (two orders of magnitude larger than the one exhibited by films grown under conventional conditions) with density of states determined by the constant photocurrent method below 4×1015 cm-3. Apart from that, the films grown are less affected by light soaking than the conventional films.

In this work, we present a model to interpret the steady-state and the dynamic detection limits of 1-D Thin Film Position Sensitive Detectors (1-D TFPSD) based on p-i-n a-Si:H devices. From this, an equivalent electric circuit is derived and the predicted values are compared with the experimental results obtained in 1-D TFPSD devices, with different sizes. The model is also able to determine the device characteristics that influence the spatial limits and the response time of the device. © 1996 IEEE.

A linear array thin film position sensitive detector (LTFPSD) based on hydrogenated amorphous silicon (a-Si:H) is proposed for the first time, taking advantage of the optical properties presented by a-Si:H devices we have developed a LTFPSD with 128 integrated elements able to be used in 3-D inspections/measurements. Each element consists on a one-dimensional LTFPSD, based on a p.i.n. diode produced in a conventional PECVD system, where the doped layers are coated with thin resistive layers to establish the required device equipotentials. By proper incorporation of the LTFPSD into an optical inspection camera it is possible to acquire information about an object/surface, through the optical cross-section method. The main advantages of this system, when compared with the conventional CCDs, are the low complexity of hardware and software used and that the information can be continuously processed (analogue detection).

This paper reports the performance of small area solar cells, 128 linear integrated position sensitive detector arrays and thin film transistors based on nanostructured silicon thin films produced by plasma-enhanced chemical vapour deposition technique, close to the onset of dusty plasma conditions, within the transition region from amorphous to microcrystalline. The small area solar cells, produced in a modified single chamber reactor, exhibited very good electrical characteristics with a conversion efficiency exceeding 9%. The 128 integrated position sensitive detector arrays, based on a similar pin structure, allow real-time 3D object imaging with a resolution higher than 90 l p/mm. The thin film transistors produced exhibited field effect mobility of 2.47 cm 2/V/s, threshold voltage of 2 V, on/off ratio larger than 10 7 and sub-threshold slopes of 0.32 V/decade, which are amongst the best results reported for this type of device. © 2009 Taylor & Francis.

This paper studies the dc and ac impedance behaviour of undoped ZnO thin films produced by spray pyrolysis and rf magnetron sputtering under UV light illumination, at room temperature, emphasising the role that the crystallite size, structure, surface morphology and the state of surface have on the electrical responsivities obtained. The results achieved show that the sputtered films with crystal sizes of about 4 nm exhibit dc electrical UV responsivities of 108. On the other hand, the spray pyrolysis films exhibit the lowest dc responsivities, due the high crystal sizes and state of surface contamination, to which very good capacitance responses were obtained, mainly due to the degree of porosity exhibit by these films when produced at low temperatures. Based on that, a two-phase electrical model is proposed to explain the set of behaviours observed. © 2005 Elsevier B.V. All rights reserved.