Fortunato, E., Barquinha Pereira Gonçalves Martins P. L. G. "
Multicomponent wide band gap oxide semiconductors for thin film transistors."
Proceedings of International Meeting on Information Display. Vol. 2006. 2006. 605-608.
AbstractThe recent application of wide band gap oxide semiconductors to transparent thin film transistors (TTFTs) is making a fast and growing (r)evolution on the contemporary solid-state electronics. In this paper we present some of the recent results we have obtained using wide band gap oxide semiconductors, like indium zinc oxide, produced by rf sputtering at room temperature. The devices work in the enhancement mode and exhibit excellent saturation drain currents. On-off ratios above 106 are achieved. The optical transmittance data in the visible range reveals average transmittance higher than 80%, including the glass substrate. Channel mobilities are also quite respectable, with some devices presenting values around 25 cm2/Vs, even without any annealing or other post deposition improvement processes. The high performances presented by these TTFTs associated to a high electron mobility, at least two orders of magnitude higher than that of conventional amorphous silicon TFTs and a low threshold voltage, opens new doors for applications in flexible, wearable, disposable portable electronics as well as battery-powered applications.
Fortunato, E., Gonçalves Marques Assunção Ferreira Águas Pereira Martins A. A. V. "
Gallium zinc oxide coated polymeric substrates for optoelectronic applications."
Materials Research Society Symposium - Proceedings. Vol. 769. 2003. 291-296.
AbstractHighly transparent and conductive ZnO:Ga thin films were produced by rf magnetron sputtering at room temperature on polyethylene naphthalate substrates. The films present a good electrical and optical stability, surface uniformity and a very good adhesion to the polymeric substrates. The lowest resistivity obtained was 5×10-4 Ωcm with a sheet resistance of 15 Ω/sqr and an average optical transmittance in the visible part of the spectra of 80%. It was also shown that by passivating the polymeric surface with a thin SiO2 layer, the electrical and structural properties of the films are improved nearly by a factor of 2.
Fortunato, E.M.C., Brida Ferreira Águas Nunes Cabrita Giuliani Nunes Maneira Martins D. I. M. M. "
Large area flexible amorphous silicon position sensitive detectors."
Materials Research Society Symposium - Proceedings. Vol. 609. 2000. A1271-A1276.
AbstractLarge area thin film position sensitive detectors based on amorphous silicon technology have been prepared on polyimide substrates using the conventional plasma enhanced chemical vapour deposition technique. The sensors have been characterised by spectral response, illuminated I-V characteristics and position detectability measurements. The obtained one dimensional position sensors with 5 mm wide and 60 mm long present a maximum spectral response at 600 nm, an open circuit voltage of 0.6 V° and a position detectability with a correlation of 0.9989 associated to a standard deviation of 1 × 10-2, comparable to those ones produced on glass substrates. The surface of the sensors at each stage of fabrication was investigated by Atomic Force Microscopy.
Fortunato, E.a, Pereira Barquinha Botelho Do Rego Gongalves Vilà Morante Martins L. a P. a. "
High mobility indium free amorphous oxide based thin film transistors."
Proceedings of International Meeting on Information Display. Vol. 8. 2008. 1199-1202.
AbstractHigh mobility bottom gate thin film transistors (TFTs) with an amorphous gallium tin zinc oxide (a-GSZO) channel layer have been produced by rf magnetron cosputtering using a gallium zinc oxide (GZO) and tin (Sn) targets. The effect of the post annealing temperatures (200 °C, 250 °C and 300 °C) was evaluated and compared with two series of TFTs produced at room temperature and 150 °C during the channel deposition. From the results it was observed that the effect ofpos annealing is crucial for both series of TFTs either for stability as well as for improving the electrical characteristics. The a-GSZO TFTs operate in the enhancement mode (n-type), present a high saturation mobility of 24.6 cm2/Vs, a subthreshold gate swing voltage of 0.38 V/decade, a turn-on voltage of -0.5 V, a threshold voltage of 4.6 V and an ION/IOFF ratio of 8x107, satisfying all the requirements to be used in active-matrix backplane.
Fortunato, E., Martins R. "
Role of the collecting resistive layer on the static characteristics of 2D a-Si:H thin film position sensitive detector."
Materials Research Society Symposium - Proceedings. Vol. 507. 1999. 303-308.
AbstractThe aim of this work is to present an analytical model able to interpret the role of the thin collecting resistive layer on the static performances exhibited by 2D amorphous silicon hydrogenated pin thin film position sensitive detectors. In addition, experimental results concerning the device linearity and spatial resolution are presented and checked against the predicted values of the analytical model proposed.
Fortunato, E., Barquinha Gonçalves Pereira Martins P. G. L. "
New amorphous oxide semiconductor for thin film transistors (TFTs)."
Materials Science Forum. 587-588 (2008): 348-352.
AbstractThin film transistors (TFTs) have been produced by rf magnetron sputtering at room temperature, using non conventional oxide materials like amorphous indium-zinc-oxide (IZO) semiconductor, for the channel as well as for the drain and source regions. The obtained TFTs operate in the enhancement mode with threshold voltages of 2.4 V, saturation mobility of 22.7 cm2/Vs, gate voltage swing of 0.44 V/dec and an ON/OFF current ratio of 7×10 7. The high performances presented by these TFTs associated to a high electron mobility, at least two orders of magnitude higher than that of conventional amorphous silicon TFTs and a low threshold voltage, opens new doors for applications in flexible, wearable, disposable portable electronics as well as battery-powered applications.