Correlation between the carbon and hydrogen contents with the gas species and the plasma impedance of silicon carbide films produced by PECVD technique | Hugo Águas

Correlation between the carbon and hydrogen contents with the gas species and the plasma impedance of silicon carbide films produced by PECVD technique

Citation:: Martins, R., V. Silva, H. Águas, A. Cabrita, I. Ferreira, and E. Fortunato. "Correlation between the carbon and hydrogen contents with the gas species and the plasma impedance of silicon carbide films produced by PECVD technique." Applied surface science. 184 (2001): 101-106.

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