Publications

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Aguas, H., Roca P. i Cabarrocas, S. Lebib, V. Silva, E. Fortunato, and R. Martins. "Polymorphous silicon deposited in large area reactor at 13 and 27 MHz." Thin Solid Films. 427 (2003): 6-10. Abstract
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Águas, H., R. Martins, and E. Fortunato. "Plasma diagnostics of a PECVD system using different RF electrode configurations." Vacuum. 56 (2000): 31-37. Abstract
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Águas, Hugo, Lu{\'ıs Pereira, Leandro Raniero, Elvira Fortunato, and Rodrigo Martins. "MIS Photodiodes of Polymorphous Silicon Deposited at Higher Growth Rates by 27.12 MHz PECVD Discharge." Materials Science Forum. Vol. 455. Trans Tech Publications, 2004. 73-76. Abstract
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Águas, Hugo, Sanjay K. Ram, Andreia Araújo, Diana Gaspar, António Vicente, Sergej A. Filonovich, Elvira Fortunato, Rodrigo Martins, and Isabel Ferreira. "Silicon thin film solar cells on commercial tiles." Energy & Environmental Science. 4 (2011): 4620-4632. Abstract
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Aguas, H., L. Pereira, D. Costa, E. Fortunato, and R. Martins. "Super linear position sensitive detectors using MIS structures." Optical Materials. 27 (2005): 1088-1092. Abstract
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Águas, H., E. Fortunato, and R. Martins. "Role of the i layer surface properties on the performance of a-Si: H Schottky barrier photodiodes." Sensors and Actuators A: Physical. 99 (2002): 220-223. Abstract
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Aguas, H., L. Pereira, L. Raniero, D. Costa, E. Fortunato, and R. Martins. "Investigation of a-Si: H 1D MIS position sensitive detectors for application in 3D sensors." Journal of non-crystalline solids. 352 (2006): 1787-1791. Abstract
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Aguas, H., A. Goullet, L. Pereira, E. Fortunato, and R. Martins. "Effect of the tunnelling oxide thickness and density on the performance of MIS photodiodes." Thin solid films. 451 (2004): 361-365. Abstract
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Águas, Hugo, Elvira Fortunato, Lu{\'ıs Pereira, V. Silva, and Rodrigo Martins. "Role of the i-Layer Thickness in the Performance of a-Si: H Schottky Barrier Photodiodes." Key Engineering Materials. Vol. 230. Trans Tech Publications, 2002. 587-590. Abstract
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Águas, Hugo, Lu{\'ıs Pereira, Isabel Ferreira, A. R. Ramos, A. S. Viana, J. Andreu, Paula M. Vilarinho, Elvira Fortunato, and Rodrigo Martins. "Effect of annealing on gold rectifying contacts in amorphous silicon." Materials Science Forum. Vol. 455. Trans Tech Publications, 2004. 96-99. Abstract
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Águas, H., L. Perreira, R. J. C. Silva, E. Fortunato, and R. Martins. "Effect of the tunnelling oxide growth by H 2 O 2 oxidation on the performance of a-Si: H MIS photodiodes." Materials Science and Engineering: B. 109 (2004): 256-259. Abstract
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Águas, H., A. Gonçalves, L. Pereira, R. Silva, E. Fortunato, and R. Martins. "Spectroscopic ellipsometry study of amorphous silicon anodically oxidised." Thin Solid Films. 427 (2003): 345-349. Abstract
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Águas, Hugo, António Marques, Rodrigo Martins, and Elvira Fortunato. "Fast and cheap method to qualitatively measure the thickness and uniformity of ZrO 2 thin films." Materials Science in Semiconductor Processing. 4 (2001): 319-321. Abstract
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Águas, H., L. Raniero, L. Pereira, E. Fortunato, and R. Martins. "Effect of the discharge frequency and impedance on the structural properties of polymorphous silicon." Thin solid films. 451 (2004): 264-268. Abstract
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Águas, Hugo MB, Elvira M. C. Fortunato, Ana M. Cabrita, Vitor Silva, Pedro MN Tonello, and Rodrigo F. P. Martins. "Correlation Between Surface/Interface States and the Performance of MIS Structures." MRS Proceedings. Vol. 609. Cambridge University Press, 2000. A12-1. Abstract
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Aguas, Hugo, Ana Cabrita, Pedro Tonello, Patricia Nunes, Elvira Fortunato, and Rodrigo Martins. "Two Step Process for the Growth of a Thin Layer of Silicon Dioxide for Tunneling Effect Applications." MRS Proceedings. Vol. 619. Cambridge University Press, 2000. 179. Abstract
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Águas, H., L. Raniero, L. Pereira, E. Fortunato, Roca P. i Cabarrocas, and R. Martins. "Polymorphous Silicon Films Produced in Large Area Reactors by PECVD at 27.12 MHz and 13.56 MHz." MRS Proceedings. Vol. 762. Cambridge University Press, 2003. A5-13. Abstract
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Águas, H., L. Pereira, Raniero L. E. Fortunato, and R. Martins. "Effect of the load resistance in the linearity and sensitivity of MIS position sensitive detectors." MRS Online Proceedings Library Archive. 862 (2005). Abstract
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Araújo, Andreia, Raquel Barros, Tiago Mateus, Diana Gaspar, Nuno Neves, António Vicente, Sergej A. Filonovich, Pedro Barquinha, Elvira Fortunato, Ana M. Ferraria, and others. "Role of a disperse carbon interlayer on the performances of tandem a-Si solar cells." Science and Technology of Advanced Materials. 14 (2013): 045009. Abstract
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Araújo, Andreia, Ana Pimentel, Maria João Oliveira, Manuel J. Mendes, Ricardo Franco, Elvira Fortunato, Hugo Águas, and Rodrigo Martins. "Direct growth of plasmonic nanorod forests on paper substrates for low-cost flexible 3D SERS platforms." Flexible and Printed Electronics. 2 (2017): 014001. Abstract
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Araújo, Andreia, Manuel J. Mendes, Tiago Mateus, António Vicente, Daniela Nunes, Tomas Calmeiro, Elvira Fortunato, Hugo Águas, and Rodrigo Martins. "Influence of the substrate on the morphology of self-assembled silver nanoparticles by rapid thermal annealing." The Journal of Physical Chemistry C. 120 (2016): 18235-18242. Abstract
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Araújo, Andreia, Carlos Caro, Manuel J. Mendes, Daniela Nunes, Elvira Fortunato, Ricardo Franco, Hugo Águas, and Rodrigo Martins. "Highly efficient nanoplasmonic SERS on cardboard packaging substrates." Nanotechnology. 25 (2014): 415202. Abstract
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Assunção, Vitor, Elvira Fortunato, António Marques, Alexandra Gonçalves, Isabel Ferreira, Hugo Águas, and Rodrigo Martins. "New challenges on gallium-doped zinc oxide films prepared by rf magnetron sputtering." Thin Solid Films. 442 (2003): 102-106. Abstract
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Assuncao, V., E. Fortunato, A. Marques, H. Aguas, I. Ferreira, M. E. V. Costa, and R. Martins. "Influence of the deposition pressure on the properties of transparent and conductive ZnO: Ga thin-film produced by rf sputtering at room temperature." Thin Solid Films. 427 (2003): 401-405. Abstract
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Barquinha, P., L. Pereira, H. Aguas, E. Fortunato, and R. Martins. "Influence of the deposition conditions on the properties of titanium oxide produced by rf magnetron sputtering." Materials science in semiconductor processing. 7 (2004): 243-247. Abstract
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