Rodrigo Martins

Nanostructured silicon thin films were produced in a single PECVD (Plasma Enhanced Chemical Vapour Deposition) reactor using an excitation frequency of 27.12 MHz. The process parameters were selected to allow the films' production to be performed at the transition region (from amorphous to microcrystalline), aiming their use in solar cells. The real and imaginary parts of pseudo-dielectric function of these nanostructured films show a shift to higher energies and the order factor reveals an improvement on the short atomic range order of the films produced. The solar cells with a structure of ZGO/p-a-SiC:H/buffer1/buffer2/i-(nc/a-Si:H)/n-a-Si:H/Ag/Al were deposited with nanostructured intrinsic layer, showing a good performances, with current densities of about 14.48 mA/cm2, open circuit voltage of 0.94 V, and fill factor of 0.67, which lead to efficiencies of 9.12%. The solar cell degradation study performed under AM1.5 spectrum conditions up to 100 hours revealed a decrease on the solar cell efficiency of about 8.11%, mainly related to the decreasing of current density. Despite that, the open circuit voltage increases slightly after the degradation.

This work shows the effect of the annealing temperature and atmosphere on the properties of r.f. magnetron sputtered indium-zinc oxide (IZO) thin-films of two types: one a conductive film (as-deposited, room temperature) that exhibits a resistivity of 3.5 × 10- 4 Ω cm; the other, a semiconductor film with a resistivity ∼ 102 Ω cm. The annealing temperatures were changed between 125 and 500 °C. Crystallization of the more conductive films was already noticeable at temperatures around 400 °C. Three different annealing atmospheres were used - vacuum, air and oxygen. For the conductive films, only the oxygen atmosphere was critical, leading to an increase of the electrical resistivity of more than one order of magnitude, for temperatures of 250 °C and above. Concerning the semiconductor films, both temperature and atmosphere had a strong effect on the film's properties, and the resistivity of the annealed films was always considerably smaller than the as-deposited films. Finally, some results of the application of these films to transparent TFTs are shown. © 2007 Elsevier B.V. All rights reserved.

Indium molybdenum oxide thin films were RF sputtered at room temperature on glass substrates with a reference base pressure of 7.5 × 10- 4 Pa. The electrical and optical properties of the films were studied as a function of oxygen partial pressures (OPP) ranging from 1.5 × 10- 3 Pa to 3.5 × 10- 3 Pa. The obtained data show that the bulk resistivity of the films increased by about 4 orders of magnitude (from 7.9 × 10- 3 to 7.6 × 101 Ω-cm) when the OPP increased from 1.5 × 10-3 to 3.5 × 10- 3 Pa, and the carrier concentration decreased by about 4 orders (from 1.77 × 1020 to 2.31 × 1016 cm- 3). On the other hand, the average visible transmittance of 30.54% of the films (brown colour; OPP = 1.5 × 10- 3 Pa) was increased with increasing OPP to a maximum of 80.47% (OPP = 3.5 × 10- 3 Pa). The optical band gap calculated from the absorption edge of the transmittance spectra ranges from 3.77 to 3.88 eV. Further, the optical and electrical properties of the films differ from those deposited at similar conditions but with a base pressure lower than 7.5 × 10- 4 Pa. © 2007 Elsevier B.V. All rights reserved.

In this work we present a study on the effect of annealing temperatures on the structural, morphological, electrical and optical characteristics of gallium doped zinc oxide (GZO), indium zinc oxide (IZO) and indium-tin-oxide (ITO) films. GZO and IZO films were deposited at room temperature by r.f. magnetron sputtering, whereas the ITO films were commercial ones purchased from Balzers. All films were annealed at temperatures of 250 and 500 °C in open air for 1 h. The GZO and ITO films were polycrystalline. The amorphous structure of as-deposited IZO films becomes crystalline on high temperature annealing (500 °C). The sheet resistivity increased with increase in annealing temperature. GZO films showed an increase of 6 orders of magnitude. The optical transmittance and band gap of as-deposited films varied with annealing. The highest transmittance (over 95 %) and maximum band gap (3.93 eV) have been obtained for ITO films. © 2007 Elsevier B.V. All rights reserved.

Nitrogen-doped ZnO films were deposited by RF magnetron sputtering in 75% of N2 / (Ar + N2) gas atmosphere. The influence of substrate temperature ranging from room temperature (RT) to 300 °C was analyzed by X-ray diffractometry (XRD), spectrophotometry, X-ray photoelectron spectroscopy (XPS), secondary-ion mass spectrometry (SIMS) and Hall measurements setup. The XRD studies confirmed the hexagonal ZnO structure and showed that the crystallinity of these films increased with increasing substrate temperature (Ts). The optical studies indicate the average visible transmittance in the wavelength ranging 500-800 nm increases with increasing Ts. A minimum transmittance (9.84%) obtained for the films deposited at RT increased with increasing Ts to a maximum of 88.59% at 300 °C (500-800 nm). Furthermore, it was understood that the band gap widens with increasing Ts from 1.99 eV (RT) to 3.30 eV (250 °C). Compositional analyses (XPS and SIMS) confirmed the nitrogen (N) incorporation into the ZnO films and its decreasing concentration with increasing Ts. The negative sign of Hall coefficients confirmed the n-type conducting. © 2007 Elsevier B.V. All rights reserved.

Nitrogen (N)-doped ZnO thin films were RF sputtered with different N2 volume (ranging from 10% to 100%) on sapphire (001) substrates. The influence of N2 vol.% on the properties of ZnO films was analyzed by various characterization techniques. The X-ray diffraction studies showed that the films grow along the preferential (002) crystallographic plane and the crystallinity varied with varying N2 vol.%. The films sputtered with 25 vol.% N2 showed better crystallinity. The transmittance was decreased with increasing N2 volume until 25% and was almost constant above 25%. A maximum optical band gap (2.08 eV) obtained for 10 vol.% N2 decreased with increasing N2 volume to reach a minimum of 1.53 eV at 100%. The compositional analysis confirmed the incorporation of N into ZnO films, and its concentration increased with increasing N2 volume to reach a maximum of ∼ 3.7 × 1021 atom/cm3 at 75% but then decreased slightly to 3.42 × 1021 atoms/cm3. The sign of Hall coefficient confirmed that the films sputtered with ≤ 25 vol.% N2 possess p-type conductivity which changes to n-type for > 25 vol.% N2. © 2007 Elsevier B.V. All rights reserved.

The devices analyzed in this work present an S-shape J-V characteristic when illuminated. By changing the light flux a non linear dependence of the photocurrent with illumination is observed. Thus a low intensity light beam can be used to probe the local illumination conditions, since a relationship exists between the probe beam photocurrent and the steady state illumination. Numerical simulation studies showed that the origin of this S-shape lies in a reduced electric field across the intrinsic region, which causes an increase in the recombination losses. Based on this, we present a model for the device consisting of a modulated barrier recombination junction in addition to the p-i-n junction. The simulated results are in good agreement with the experimental data. Using the presented model a good estimative of the LSP signal under different illumination conditions can be obtained, thus simplifying the development of applications using the LSP as an image sensor, with advantages over the existing imaging systems in the large area sensor fields with the low cost associated to the amorphous silicon technology. © 2007 Materials Research Society.

Here we describe an innovative optoelectronic platform which enables the specific detection of unamplified nucleic acid sequences with the integration of oligonucleotide-derivatized gold nanoparticles, a colour sensor and a light emission source for a colorimetric detection method. This new low cost, fast and simple optoelectronic platform permits detection of less than 1 picomole quantities of nucleic acid without target or signal amplification. ©2007 IEEE.

In the production of porous silicon (PS) to optoelectronic application one of the most significant constrains is the surface defects passivation. In the present work we investigate, gallium-doped zinc oxide (GZO) thin films deposited by rf magnetron sputtering at room temperature on PS obtained with different etching times. The X-ray diffraction (XRD), Fourier transform infrared (FTIR) and atomic force microscopy (AFM) analysis have been carried out to understand the effect of GZO films coating on PS. Further, the XRD analysis suggests the formation of a good crystalline quality of the GZO films on PS. From AFM investigation we observe that the surface roughness increases after GZO film coating. The photoluminescence (PL) measurements on PS and GZO films deposited PS shows three emission peaks at around 1.9 eV (red-band), 2.78 eV (blue-band) and 3.2 eV (UV-band). PL enhancement in the blue and ultraviolet (UV) region has been achieved after GZO films deposition, which might be originated from a contribution of the near-band-edge recombination from GZO. © 2007 Elsevier B.V. All rights reserved.

The driving force behind the work herein presented is the importance of budgeting in a competitive market. The problem at hands is the creation of a budgeting methodology for reverse engineering applications, involving laser scanning, that has the ability to generate budgets for different customer accuracy requirements and for parts of different morphologic characteristics, such as: shape, dimension and/or detail complexity. A breakup approach was used to implement the methodology: the reverse engineering process was broken in nine basic identified steps and elementary sources of cost were defined at the different reverse engineering stages as well. Particular budgeting methodologies for each step of the process were created. The obtained results so far point to the possibility of creating a complete budgeting system based on the proposed methodology. © 2008 Taylor & Francis Group.

Thin films of molybdenum-doped indium oxide (IMO) were prepared by a 3-source, cylindrical radio-frequency magnetron sputtering at room temperature. The films were post-annealed and were characterized by their structural (X-ray diffraction) and optical (UV-VIS-NIR spectrophotometer) properties. The films were studied as a function of oxygen volume percentage (O2 vol.%) ranging from 3.5 to 17.5. The structural studies revealed that the as-deposited amorphous films become crystalline on annealing. In most cases, the (222) reflection emerged as high intensive peak. The poor visible transmittance of the films as-deposited without oxygen was increased from ∼ 12% to over 80% on introducing oxygen (3.5 O2 vol.%). For the films annealed in open air, the average visible transmittance in the wavelength ranging 400-800 nm was varied between 77 and 84%. The films annealed at high temperatures (> 300 °C) decreased the transmittance to as low as < 1%. The optical band gap of the as-deposited films increased from the range 3.83-3.90 to 3.85-3.98 eV on annealing at different conditions. © 2007 Elsevier B.V. All rights reserved.

This paper aims to discuss the effect of order and disorder on the electrical performances of covalent silicon semiconductors and ZnO based ionic oxide semiconductors used as active channel layers in thin film transistors. The effect of disorder on covalent semiconductors directly affects their electrical transport properties due to the asymmetric behaviour of sp states, while in ionic oxide semiconductors it is found that this effect is small due to the fact that angular disorder has no effect on the spherical symmetry of s states. To this we must add that the mobility of carriers in both systems is quite different, being also affected by electron-phonon interactions (weak in silicon and strong in ionic oxides leading to formation of polarons). Besides, the impurity doping effect and the presence of vacancies in disordered silicon and in ionic oxides behave differently, which will influence the thin film properties and so, the performances of the devices produced. © 2007 Springer-Verlag.

The role of order and disorder on the electronic performances of n -type ionic oxides such as zinc oxide, gallium zinc oxide, and indium zinc oxide used as active (channel) or passive (drain/source) layers in thin film transistors (TFTs) processed at room temperature are discussed, taking as reference the known behavior observed in conventional covalent semiconductors such as silicon. The work performed shows that while in the oxide semiconductors the Fermi level can be pinned up within the conduction band, independent of the state of order, the same does not happen with silicon. Besides, in the oxide semiconductors the carrier mobility is not bandtail limited and so disorder does not affect so strongly the mobility as it happens in covalent semiconductors. The electrical properties of the oxide films (resistivity, carrier concentration, and mobility) are highly dependent on the oxygen vacancies (source of free carriers), which can be controlled by changing the oxygen partial pressure during the deposition process and/or by adding other metal ions to the matrix. In this case, we make the oxide matrix less sensitive to the presence of oxygen, widening the range of oxygen partial pressures that can be used and thus improving the process control of the film resistivity. The results obtained in fully transparent TFT using polycrystalline ZnO or amorphous indium zinc oxide (IZO) as channel layers and highly conductive poly/nanocrystalline ZGO films or amorphous IZO as drain/source layers show that both devices work in the enhancement mode, but the TFT with the highest electronic saturation mobility and on/off ratio 49.9 cm2 V s and 4.3× 108, respectively, are the ones in which the active and passive layers are amorphous. The ZnO TFT whose channel is based on polycrystalline ZnO, the mobility and on/off ratio are, respectively, 26 cm2 V s and 3× 106. This behavior is attributed to the fact that the electronic transport is governed by the s -like metal cation conduction bands, not significantly affected by any type of angular disorder promoted by the 2p O states related to the valence band, or small amounts of incorporated metal impurities that lead to a better control of vacancies and of the TFT off current. © 2007 American Institute of Physics.

In this work we present results of studies performed on Schottky and metal-insulator-semiconductor (MIS) position sensitive detectors (PSD) structures: substrate (glass)/ Cr (300 nm) / a-Si:H [n] (37 nm) / a-Si:H [i] (600 nm) / SiO2 (1.5 nm - for the MIS) / Au (7 nm). The effect of the interfacial oxide layer between Au and a-Si:H, for the MIS structures, was studied and compared with the Schottky, in order to determine how beneficial it could be for device performances and time degradation. For doing so, the Au thickness of 70Å was deposited by thermal evaporation on an oxide free (Schottky) and oxidized (≈20Å) (MIS) a-Si:H surfaces. These structures were characterized by SIMS, RBS, SEM and AFM in order to correlate the obtained diffusion profile of Au at the interface and the topography with the presence of the oxide at the interface. The results show that the Au inter-diffuses very easily in the oxide free a-Si:H surface, even at room temperature, degrading the devices performance. On the other hand, the MIS structures, with their interfacial oxide present no structural changes after annealing and the PSD produced are stable. We believe that this effect is associated with the barrier effect of the interfacial oxide that prevents the Au diffusion. The optimized 1D MIS sensors are stable and exhibit a linearity error as low as 0.8 % and sensitivities of 33 mV/cm for a 5 mW spot beam intensity at a wavelength of 532 nm, while the Schottky sensors showed a time degradation of their characteristics. © 2006 Materials Research Society.

Nanotechnology is having a positive impact on nearly every industry, and in particular in healthcare, where it is extending the limits of molecular diagnostics to the nanoscale-nanodiagnostics. Here we describe an innovative optoelectronic platform for the colorimetric detection of nucleic acids based on oligonucleotide-derivatized gold nanoparticles. The device integrates an amorphous/nanocrystalline biosensor and a light emission source with a gold nanoprobe for specific DNA detection. This low cost, fast and simple optoelectronic platform permits detection of few picomole of nucleic acid without target or signal amplification making it suitable for application in population diagnostics and in point-of-care hand-held devices. © 2007 Elsevier B.V. All rights reserved.

N, (N+Ga) and (N+Al) doped ZnO films were deposited on c-plane sapphire substrates by RF magnetron sputtering at room temperature. The samples were characterized by their structural, surface morphological, compositional and optical properties. The x-ray diffraction studies confirmed the co-doping of (N+Ga) and (N+Al) besides showing improvement in the crystallinity when compared with the single Ndoping. The surface of the films becomes rougher after co-doping. The x-ray photoelectron spectroscopy and Rutherford back-scattering analysis indicate that the co-doping changes the chemical states and varies the amount of nitrogen (N) in ZnO. The amount of 'N' has been greatly increased for (N+Ga) co-doping, indicating that it is the best co-doping pair for p-type ZnO. Additionally, co-doping has increased the average visible transmittance (40-650nm) and the optical band gap is shifted towards shorter wavelength. In the case of (N+Al) co-doping, the band gap becomes wider than that of undoped ZnO. © IOP Publishing Ltd.

In this work we studied indium zinc oxide (IZO) thin films deposited by r.f. magnetron sputtering at room temperature. The films were annealed at high temperature (1100 K) in vacuum, and the oxygen exodiffusion was monitored in-situ. The results showed three main peaks, one at approximately 600 K, other at approximately 850 K and the last one at 940 K, which are probably from oxygen bonded in the film surface and in the bulk, respectively. The initial amorphous structure becomes microcrystalline, according to the X-ray diffraction. The electrical conductivity of the films decreases (about 3 orders of magnitude), after the annealing treatment. This behavior could be explained by the crystallization of the structure, which affects the transport mechanism. Apart from the changes in the material structure, a small variation was observed on the absorption coefficient. © 2007 Elsevier B.V. All rights reserved.

Thin films of molybdenum doped indium oxide (IMO) were deposited on glass at room temperature using an in-built three-source RF magnetron sputtering. The films were studied as a function of oxygen volume percentage (O2 vol. %; ranging from 0.0 to 17.5%) in the sputtering chamber. The as-deposited amorphous films were crystallized on post-annealing. The as-deposited films are low conducting and Hall coefficients were undetectable; whereas post-annealed films possess fairly high conductivity. The lowest transmittance (11.96% at 600 nm) observed from the films deposited without oxygen increased to a maximum of 88.01% (3.5 O2 vol. %); whereas this transmittance was decreased with the increasing O2 vol. % to as low as 81.04% (15.6 O2 vol. %); a maximum of 89.80% was obtained from the films annealed at 500 °C in open air (3.5 O2 vol. %). The optical band gap of 3.80 eV obtained from the films deposited without oxygen increased with increasing O2 vol. % to as high as 3.91 eV (17.5 O2 vol. %). A maximum of 3.92 eV was obtained from the films annealed at 300 °C in N2:H2 gas atmosphere (17.5 O2 vol. %). © 2008 Elsevier Ltd. All rights reserved.

N-doped ZnO films were deposited by RF magnetron sputtering in N2/Ar gas mixture and were post-annealed at different temperatures (Ta) ranging from 400 to 800 °C in O2 gas at atmospheric pressure. The as-deposited and post-annealed films were characterized by their structural (XRD), compositional (SIMS, XPS), optical (UV-vis-NIR spectrometry), electrical (Hall measurements), and optoelectronic properties (PL spectra). The XRD results authenticate the improvement of crystallinity following post-annealing. The weak intensity of the (0 0 2) reflection obtained for the as-deposited N-doped ZnO films was increased with the increasing Ta to become the preferred orientation at higher Ta (800 °C). The amount of N-concentration and the chemical states of N element in ZnO films were changed with the Ta, especially above 400 °C. The average visible transmittance (400-800 nm) of the as-deposited films (26%) was increased with the increasing Ta to reach a maximum of 75% at 600 °C but then decreased. In the PL spectra, A0X emission at 3.321 eV was observed for Ta = 400 °C besides the main D0X emission. The intensity of the A0X emission was decreased with the increasing Ta whereas D0X emission became sharper and more optical emission centers were observed when Ta is increased above 400 °C. © 2008 Elsevier B.V. All rights reserved.

Indium molybdenum oxide thin films radio-frequency sputtered at room temperature on glass were studied as a function of oxygen volume percentage. The as-deposited films were post-annealed in the temperature range of 300-500 °C in oxidizing (open air) and reducing (N2:H2 gas) atmospheres for 1 h. The as-deposited amorphous films become crystalline on post-annealing irrespective of the annealing conditions. In most cases, the (2 2 2) diffraction line is emerged as the high intensive peak. The films annealed at ≥400 °C in N2:H2 show a carrier concentration >1020 cm-3. The better electrical properties are obtained for the films post-annealed at 300 °C. The optical transmittance of the as-deposited films varies between 10% and 85% depending on the deposition and annealing conditions. Atomic force microscope analysis reveal that the films annealed at 300 °C are composed of closely packed crystallites (size of which varies between 5 nm and 150 nm) whose size varies noticeably when the annealing temperature is raised to 400 °C. On the other hand, the surface of the films annealed at 500 °C becomes rougher, with the RMS roughness varying between 2.00 nm and 16.97 nm. The surface of the films deposited in the presence of oxygen shows metal like features when annealed at ≥400 °C in N2:H2 that is attributed to the segregation of indium. Further, the segregation of In is substantiated from the scanning electron microscope analysis of these samples. © 2008 Elsevier B.V. All rights reserved.

The influence of oxygen content, radio-frequency (rf) sputtering power, and postdeposition annealing on the electrical properties of gallium-indium-zinc oxide (GIZO) thin-film transistors (TFTs) is analyzed. Little to no oxygen content in the sputtering chamber is crucial to obtain high-performance devices, even before annealing. In contrast, a high oxygen content and rf power lead, respectively, to unstable/poor performing and depletion mode TFTs before annealing, and mainly for these "nonideal" conditions, annealing proves to be effective to improve device performance/stability and to decrease the performance discrepancy among TFTs processed under different oxygen and rf power conditions. Best TFTs present a field-effect mobility of 46 cm2 / V s, subthreshold swing of 0.26 V/dec, threshold voltage of 0.70 V, and an on/off ratio 108 - 109. These results are a consequence of the optimized processing and of the usage of proper GIZO target composition, 1:2:1 mol. © 2008 The Electrochemical Society.

Thin films of copper oxide were obtained through thermal oxidation (100-450 °C) of evaporated metallic copper (Cu) films on glass substrates. The X-ray diffraction (XRD) studies confirmed the cubic Cu phase of the as-deposited films. The films annealed at 100 °C showed mixed Cu-Cu2O phase, whereas those annealed between 200 and 300 °C showed a single cubic Cu2O phase. A single monoclinic CuO phase was obtained from the films annealed between 350 and 450 °C. The positive sign of the Hall coefficient confirmed the p-type conductivity in the films with Cu2O phase. However, a relatively poor crystallinity of these films limited the p-type characteristics. The films with Cu and CuO phases show n-type conductivity. The surface of the as-deposited is smooth (RMS roughness of 1.47 nm) and comprised of uniformly distributed grains (AFM and SEM analysis). The post-annealing is found to be effective on the distribution of grains and their sizes. The poor transmittance of the as-deposited films (<1%) is increased to a maximum of ∼80% (800 nm) on annealing at 200 °C. The direct allowed band gap is varied between 2.03 and 3.02 eV. © 2008 Elsevier B.V. All rights reserved.

In the present work we investigate, the role of zinc oxide (ZnO) thin films passivating layer deposited by rf magnetron sputtering at room temperature on low (18%) and high (80%) porosity porous silicon (PS). The micro-Raman spectroscopy, Fourier transform infrared spectroscopy (FTIR) and atomic force microscopy (AFM) analysis have been carried out to understand the effect of ZnO films coating on PS. A systematic investigation from Raman spectroscopy suggests the formation of a good quality ZnO wurtzite structure on PS. The photoluminescence (PL) measurements on PS and ZnO coated PS shows a red, blue and UV emission bands at around ∼1.8, ∼2.78 and ∼3.2 eV. An enhancement of all PL emission bands have been achieved after ZnO films deposition on high porosity PS. © 2007 Elsevier B.V. All rights reserved.

The electron transport in n-type polycrystalline zinc oxide, nanocrystalline Zinc-Gallium-Oxygen and amorphous Indium-Zinc-Oxygen systems produced by rf magnetron sputtering at room temperature, under different oxygen partial pressure were investigated. It was found that the carrier transport is not band tail limited, being governed by metal cations irrespective to the film's structure. The highest net room temperature electron mobility was achieved on the amorphous films and noticed that for the single component oxides the mobility decreases as the carrier concentration increases, while the reverse behaviour was observed for the multicomponent oxides, independently of their structure. These behaviours are related to the role that negative charge defects in excess of 1010 cm- 2 generated on multicomponent oxides have on carriers scattering and so on their electronic performances. © 2007 Elsevier B.V. All rights reserved.

This work refers to the fabrication of hybrid solar cells based on porous silicon (PS) filled with copper phthalocyanine (CuPc) to form GZO/CuPc-PS/Si/Al structure. We used n-type Si since photoinduced charge transfer from CuPc to Si is observed only for n-type Si. The characteristic 100% peak at 6.8°2θ from XRD confirms that the CuPc coating on PS exists in α-CuPc polymorph. The systematic increase in FWHM of XRD peak at 69.1°2θ and red-shift of LO phonon Raman spectra indicate a progressive reduction of Si nanocrystallites size with increasing etching time and the estimated size agrees well with atomic force microscopic images. The FTIR results confirm the formation of α-CuPc polymorph and it is also corroborated well with XRD and Raman results. © 2008.