Vieira, Manuela, Fantoni Alessandro Macarico A.Felipe Soares Fernando Martins Rodrigo. "
Hydrogenated amorphous silicon speed sensor based on the flying spot technique."
Proceedings of SPIE - The International Society for Optical Engineering. Vol. 2397. 1995. 683-694.
AbstractPIN devices based on hydrogenated amorphous silicon (a-Si:H) became fundamental elements of many different types sensors, based on either the transverse or the lateral photovoltaic effect. In the past we have developed a transient technique, called the Flying Spot Technique (FST), based on the lateral photoeffect. FST allows, not only to infer the ambipolar diffusion length but also the effective lifetime of the photogenerated carriers once the light spot velocity and geometry of the structure were known. In this paper we propose to apply this technique backwards in order to detect the path and velocity of an object that is moving in a light source direction. The light reflected back from the object is analyzed through p.i.n. structure being the transient transverse photovoltage dependent on the object movement (position and velocity). Assuming known the transport properties of the material and the geometry of the device and using a triangulation method we show that it is possible to map the object movement. Details concerning material characterization, simulation and device geometry are presented.
Vieira, M., Martins Fortunato Soares Guimarães R. E. F. "
A-Si:H ambipolar diffusion length and effective lifetime measured by flying spot (FST) and spectral photovoltage (SPT) techniques."
Journal of Non-Crystalline Solids. 137-138 (1991): 479-482.
AbstractOn this paper we report the physical model that supports the theory of the Flying Spot Technique (FST). Through this technique it is possible to determine separately the ambipolar diffusion length (L*) and the effective lifetime (τ*) of the generated carriers, using either Schottky diodes or quasi-ohmic sandwich structures. We also report a new static method based on the Spectral Photovoltage (SPT) that allows to infer the ambipolar diffusion length and to estimate the surface recombination velocity. © 1991 Elsevier Science Publishers B.V. All rights reserved.
Vieira, M., Fantoni Fortunato Lavareda Martins A. E. G. "
AD-layer for spatial control of light induced degradation on pin devices."
Materials Research Society Symposium Proceedings. Vol. 336. 1994. 741-746.
AbstractIn this work we report experimental results on light induced metastability of a-Si: H p.i.n. devices with different microscopic/macroscopic structures and we discuss them in terms of improved stability through spatial control of charged defects grown during light exposure. By placing a thin (few A) intrinsic layer (i) between both p/i and i/n a-Si: H interfaces we are able to reduce the effective degradation rate through spatial modification of the electric field profile in the device. The electronic transport and the stability changes that accompany the change in microstructure (R) and hydrogen content (CH) of the i- and i′-layer, were monitored throughout the entire light induced degradation process and compared with the corresponding μT product (for both carriers) inferred through steady state photoconductivity and Flying Spot Technique (FST) measurements. Results show that the degradation rate is a function of CH and R of both layers and can be correlated with the density of microvoids and di-hydride bonding. Since the i′-layers have a higher CH bonded mainly as SiF2 radicals (R≈0.4), they act as an hindrance to the growth of the defect, in the active region, generating "gettering centers" whose localisation and density are tailored in such a way that they will control spatially the electric field profile during light exposure. Preliminary results show improvements in film's stability when the interfacial layer is included. So future progress toward more stable and efficient a-Si: H solar cells will depend on a careful engineering design of the devices. © 1994 Materials Research Society.
b Vieira, M.a, Fantoni Koynov Cruz Maçarico Martins A. a S. a. "
Amorphous and microcrystalline silicon p-i-n optical speed sensors based on the flying spot technique."
Journal of Non-Crystalline Solids. 198-200 (1996): 1193-1197.
AbstractFrom the flying spot technique (FST) the ambipolar diffusion length and the effective-lifetime of the carriers photogenerated by a moving light spot that strikes a p-i-n junction can be inferred. In this paper, those properties of a p-i-n junction are used together with an optical triangulation principle to determine the velocity of an object that is moving in the direction of a light source. The light reflected back from the object is analysed through an amorphous or a microcrystalline p-i-n structure. Its transient transverse photovoltage is dependent on the velocity of the object. A comparison between the performances of both kinds of devices is presented.
Vieira, M., Fantoni Macarico Soares Evans Martins A. A. F. "
Hydrogenated amorphous silicon speed sensor based on the flying spot technique."
Materials Research Society Symposium - Proceedings. Vol. 377. 1995. 839-844.
AbstractIn the past we have developed a transient technique, called the Flying Spot Technique (FST). FST allows, not only to infer the ambipolar diffusion length but also the effective lifetime of the photogenerated carriers once the light spot velocity and geometry of the structure were known. In this paper, we propose to apply this technique backwards in order to detect the path and velocity of an object that is moving in the direction of a light source. The light reflected back from the object is analyzed through a p.i.n structure being the transient transverse photovoltage dependent on the movement of the object (position and velocity). Assuming that the transport properties of the material and the geometry of the device are known and using a triangulation method we show that it is possible to map the movement of the object. Details concerning material characterization, simulation and device geometry are presented.
Vieira, M., Fortunato Lavareda Carvalho Martins E. G. C. "
Role of photodegradation on the μτ product and microstructure of the a-Si:H pin devices."
Materials Research Society Symposium Proceedings. Vol. 297. 1993. 637-642.
AbstractPIN solar cells were light soaked up to 60 hours. The cell characteristics, the optoelectronic properties and the microstructure parameter (R = I2100/I2100+I2000) as well as the hydrogen content (CH) and density of states (g(Ef)) of the active i-layer were monitored throughout the entire light induced degradation process and compared with the correspondents μτ product (for both carriers) inferred through steady photoconductivity and FST measurements. Data show a strong correlation between the decrease of μτ product for electron and the increase of the fraction of hydrogen bonded on internal surfaces (R increases from 0.1 to 0.4) suggesting structural changes during the light induced defects' formation. For holes, the μτ product remains approximately constant and only dependent on the initial hydrogen content. As g(Ef) increases, μτ presents an asymmetrical decrease showing that electrons are more sensitive to defects' growth than holes. We also observe that the rate of degradation is faster for samples having the lowest defect densities, R and CH, showing that the amount of degradation is not a simple function of the photon exposure (Gt product) but also depends on the material microstructure.