Karlovich, Alexei Yu. "
Singular integral operators with flip and unbounded coefficients on rearrangement-invariant spaces."
Functional Analysis and its Applications. Proceedings of the international conference, dedicated to the 110th anniversary of Stefan Banach, Lviv National University, Lviv, Ukraine, May 28--31, 2002. Eds. V. Kadets, and W. Zelazko. Amsterdam: Elsevier, 2004. 123-131.
AbstractWe prove Fredholm criteria for singular integral operators of the form
\[
P_++M_bP_-+M_uUP_-,
\]
where \(P_\pm\) are the Riesz projections, \(U\) is the flip operator, and \(M_b,M_u\) are operators of multiplication by functions \(b,u\), respectively, on a reflexive rearrangement-invariant space with nontrivial Boyd indices over the unit circle. We assume a priori that \(M_b\) is bounded, but \(M_u\) may be unbounded. The function \(u\) belongs to a class of, in general, unbounded functions that relates to the Douglas algebra \(H^\infty+C\).
Karlovich, Alexei Yu. "
Some algebras of functions with Fourier coefficients in weighted Orlicz sequence spaces."
Operator Theoretical Methods and Applications to Mathematical Physics. The Erhard Meister Memorial Volume. Operator Theory: Advances and Applications, 147. Eds. Israel Gohberg, Wolfgang Wendland, António Ferreira dos Santos, Frank-Ollme Speck, and Francisco Sepúlveda Teixeira. Basel: Birkhäuser, 2004. 287-296.
AbstractIn this paper, the author proves that the set of all integrable functions whose sequences of negative (resp. nonnegative) Fourier coefficients belong to \(\ell^1\cap\ell^\Phi_{\varphi,w}\) (resp. to \(\ell^1\cap\ell^\Psi_{\psi,\varrho}\)), where \(\ell^\Phi_{\varphi,w}\) and \(\ell^\Psi_{\psi,\varrho}\) are two-weighted Orlicz sequence spaces, forms an algebra under pointwise multiplication whenever the weight sequences
\[
\varphi=\{\varphi_n\},\quad
\psi=\{\psi_n\},\quad
w=\{w_n\},\quad
\varrho=\{\varrho_n\}
\]
increase and satisfy the \(\Delta_2\)-condition.
Silva, A., Raniero Ferreira Águas Pereira Fortunato Martins L. E. H. "
Silicon etching in CF4/O2 and SF6 atmospheres."
Materials Science Forum. 455-456 (2004): 120-123.
AbstractThe aim of this work is to present a process able to allow a fast method to clean plasma enhanced chemical vapour deposition (PECVD) systems used to produce amorphous silicon films and their alloys, and a proper device patterning when required. In this work we propose to study CF4/O2 or SF6 as etchant gases at room temperature to perform cleaning and films patterning. The aim is to select the process that leads to a faster cleaning process without formation of residual contaminants or to anisotropic patterning of very thin layers. The influence of some plasma parameters, such as pressure (p), power (P) and flow (f) for the etchant gases used will be also analysed.
Pereira, L., H. Aguas, R. Igreja, R. M. S. Martins, N. Nedev, L. Raniero, E. Fortunato, and R. Martins. "
Sputtering preparation of silicon nitride thin films for gate dielectric applications."
Advanced Materials Forum Ii. Eds. R. Martins, E. Fortunato, I. Ferreira, and C. Dias. Vol. 455-456. Materials Science Forum, 455-456. 2004. 69-72.
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