Sputtering preparation of silicon nitride thin films for gate dielectric applications | Hugo Águas

Sputtering preparation of silicon nitride thin films for gate dielectric applications

Citation:: Pereira, Lu{\'ıs, Hugo Águas, Rui Igreja, Rui Miguel S. Martins, N. Nedev, Leandro Raniero, Elvira Fortunato, and Rodrigo Martins. "Sputtering preparation of silicon nitride thin films for gate dielectric applications." Materials Science Forum. Vol. 455. Trans Tech Publications, 2004. 69-72.

Abstract:

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