Aluminum doped zinc oxide sputtering targets obtained from nanostructured powders: Processing and application
- Citation:
- b Neves, N.a b, Barros Antunes Calado Fortunato Martins Ferreira R. a E. a. "Aluminum doped zinc oxide sputtering targets obtained from nanostructured powders: Processing and application." Journal of the European Ceramic Society. 32 (2012): 4381-4391.
Abstract:
This work reports the production of ceramic targets based on nanostructured Al-doped ZnO (AZO) powders for sputtering applications. The nanostructured powder is obtained by a new patented process based on the detonation of an emulsion containing both Zn and Al metal precursors in the final proportion of 98:2wt% (ZnO:Al 2O 3), through which the Al contains is highly uniform distributed over ZnO. Due to the nanostructured powder characteristics, the targets can be sintered at substantially lower temperatures (1150-1250°C) by conventional sintering, contributing to production costs reduction of ceramic targets and consequently the costs of photovoltaic and displays industries. Electrical resistivity values around 3.0-7.0×10 -3Ωcm have been obtained depending on final microstructure of the targets. The electro-optical properties of the films produced at room temperature with thicknesses around 360nm, besides being highly uniform exhibit a resistivity of about 1×10 -3Ωcm and a transmittance in the visible range above 90%. © 2012 Elsevier Ltd.
Notes:
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