<?xml version="1.0" encoding="UTF-8"?><xml><records><record><source-app name="Biblio" version="6.x">Drupal-Biblio</source-app><ref-type>17</ref-type><contributors><authors><author><style face="normal" font="default" size="100%">Neves, N.a b , Barros, R.a b , Antunes, E.a , Calado, J.a , Fortunato, E.b , Martins, R.b , Ferreira, I.b</style></author></authors></contributors><titles><title><style face="normal" font="default" size="100%">Aluminum doped zinc oxide sputtering targets obtained from nanostructured powders: Processing and application</style></title><secondary-title><style face="normal" font="default" size="100%">Journal of the European Ceramic Society</style></secondary-title></titles><dates><year><style  face="normal" font="default" size="100%">2012</style></year></dates><urls><web-urls><url><style face="normal" font="default" size="100%">https://www.scopus.com/inward/record.uri?eid=2-s2.0-84866839575&amp;partnerID=40&amp;md5=83afb5f2dc54eeddeb0744800219c701</style></url></web-urls></urls><number><style face="normal" font="default" size="100%">16</style></number><volume><style face="normal" font="default" size="100%">32</style></volume><pages><style face="normal" font="default" size="100%">4381-4391</style></pages><language><style face="normal" font="default" size="100%">eng</style></language><abstract><style face="normal" font="default" size="100%">&lt;p&gt;This work reports the production of ceramic targets based on nanostructured Al-doped ZnO (AZO) powders for sputtering applications. The nanostructured powder is obtained by a new patented process based on the detonation of an emulsion containing both Zn and Al metal precursors in the final proportion of 98:2wt% (ZnO:Al 2O 3), through which the Al contains is highly uniform distributed over ZnO. Due to the nanostructured powder characteristics, the targets can be sintered at substantially lower temperatures (1150-1250°C) by conventional sintering, contributing to production costs reduction of ceramic targets and consequently the costs of photovoltaic and displays industries. Electrical resistivity values around 3.0-7.0×10 -3Ωcm have been obtained depending on final microstructure of the targets. The electro-optical properties of the films produced at room temperature with thicknesses around 360nm, besides being highly uniform exhibit a resistivity of about 1×10 -3Ωcm and a transmittance in the visible range above 90%. © 2012 Elsevier Ltd.&lt;/p&gt;
</style></abstract><notes><style face="normal" font="default" size="100%">&lt;p&gt;cited By 27&lt;/p&gt;
</style></notes></record></records></xml>