Luís Miguel Nunes Pereira
DCM - Departamento de Ciência dos Materiais
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2004
Raniero, L, Martins, R, Aguas, and H.
"
{Growth of polymorphous/nanocrystalline silicon films deposited by PECVD at 13.56 MHz}
." 455-456 (2004): 532-535.
Abstract
Website
n/a
Fortunato, E, Pimentel, A, Pereira, and L.
"
{High field-effect mobility zinc oxide thin film transistors produced at room temperature}
." 338 (2004): 806-809.
Abstract
Website
n/a
Aguas, H, Pereira, L, and Raniero.
"
{MIS photodiodes of polyrnorphous silicon deposited at higher growth rates by 27.12 MHz PECVD discharge}
." 455-456 (2004): 73-76.
Abstract
Website
n/a
Pereira, L, Aguas, H, and Raniero.
"
{Role of substrate on the growth process of polycrystalline silicon thin films by low-pressure chemical vapour deposition}
." 455-456 (2004): 112-115.
Abstract
Website
n/a
Silva, M. A. G., A, Raniero, L, Ferreira, and E.
"
{Silicon etching in CF(4)/O(2) and SF(6) atmospheres}
." 455-456 (2004): 120-123.
Abstract
Website
n/a
Pereira, L, Aguas, H, Igreja, and R.
"
{Sputtering preparation of silicon nitride thin films for gate dielectric applications}
." 455-456 (2004): 69-72.
Abstract
Website
n/a
2003
Aguas, H, Pereira, L, Goullet, and A.
"
{Correlation between the tunnelling oxide and I-V curves of MIS photodiodes}
." 762 (2003): 217-222.
Abstract
Website
n/a
Aguas, H, Raniero, L, and Pereira.
"
{Polymorphous silicon films produced in large area reactors by PECVD at 27.12 MHz and 13.56 MHz}
." 762 (2003): 589-594.
Abstract
Website
n/a
Mauricio, RM, Pereira, LGR, Goncalves, and LC.
"
{Potential of semi-automated in vitro gas production technique for sorghum silages evaluation}
." 32 (2003): 1013-1020.
Abstract
Website
n/a
2002
Fortunato, E, Brida, D, Pereira, and L.
"
{Dependence of the strains and residual mechanical stresses on the performances presented by a-Si : H thin film position sensors}
." 4 (2002): 612-616.
Abstract
Website
n/a
Cabrita, A, Pereira, L, Brida, and D.
"
{Role of the density of states in the colour selection of the collection spectrum of amorphous silicon-based Schottky photodiodes}
." 230-2 (2002): 559-562.
Abstract
Website
n/a
Aguas, H, Fortunato, E, Pereira, and L.
"
{Role of the i-layer thickness in the performance of a-Si : H Schottky barrier photodiodes}
." 230-2 (2002): 587-590.
Abstract
Website
n/a
2001
Cabrita, A., L. Pereira, D. Brida, A. Lopes, A. Marques, I. Ferreira, E. Fortunato, and R. Martins.
"
{Silicon carbide photodiodes: Schottky and PINIP structures}
."
Applied Surface Science
. 184 (2001): 437-442.
Abstract
Website
n/a
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