{Growth of polymorphous/nanocrystalline silicon films deposited by PECVD at 13.56 MHz}

Citation:
Raniero, L, Martins, R, Aguas, and H. "{Growth of polymorphous/nanocrystalline silicon films deposited by PECVD at 13.56 MHz}." 455-456 (2004): 532-535.

Abstract:

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Notes:

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