Publications

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Journal Article
Ferreira, Isabel M. M., Ana MF Cabrita, Elvira M. C. Fortunato, and Rodrigo F. P. Martins. "N-Type Silicon Films Produced By Hot Wire Technique." MATERIALS RESEARCH SOCIETY SYMPOSIUM PROCEEDINGS. 609 (2001): A6. 5-A6. 5. Abstract
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Ferreira, I., Braz F. Fernandes, P. Vilarinho, E. Fortunato, and R. Martins. "Nanocrystalline p-type silicon films produced by hot wire plasma assisted technique." Materials Science and Engineering: C. 15.1 (2001): 137-140. Abstract
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Ferreira, I., B. Fernandes, and R. Martins. "Nanocrystalline silicon carbon doped films prepared by hot wire technique." Vacuum. 52.1 (1999): 147-152. Abstract
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Ferreira, Isabel M. M., Rodrigo F. P. Martins, Ana MF Cabrita, Elvira M. C. Fortunato, and Paula Vilarinho. "Nanocrystalline Undoped Silicon Films Produced By Hot Wire Plasma Assisted Technique." MATERIALS RESEARCH SOCIETY SYMPOSIUM PROCEEDINGS. 609 (2001): A22. 4-A22. 4. Abstract
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Martins, R., Leandro Raniero, Luis Pereira, Daniel Costa†, Hugo Aguas, Sonia Pereira, Leonardo Silva, A. Gonçalves, I. Ferreira, and E. Fortunato. "Nanostructured silicon and its application to solar cells, position sensors and thin film transistors." Philosophical Magazine. 89.28-30 (2009): 2699-2721. Abstract
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Martins, R., H. Aguas, V. Silva, I. Ferreira, A. Cabrita, and E. Fortunato. "Nanostructured silicon films produced by PECVD." MATERIALS RESEARCH SOCIETY SYMPOSIUM PROCEEDINGS. 664 (2001): A9. 6-A9. 6. Abstract
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Carvalho, J., I. Ferreira, B. Fernandes, J. Fidalgo, and R. Martins. "Nd-YAG Laser Induced Crystallization on a-Si: H Thin Films." MRS Proceedings. 358.1 (1994). Abstract
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Assunção, Vitor, Elvira Fortunato, António Marques, Alexandra Gonçalves, Isabel Ferreira, Hugo Águas, and Rodrigo Martins. "New challenges on gallium-doped zinc oxide films prepared by rf magnetron sputtering." Thin Solid Films. 442.1 (2003): 102-106. Abstract
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Fortunato, E., A. Gonçalves, A. Marques, A. Viana, H. Águas, L. Pereira, I. Ferreira, P. Vilarinho, and R. Martins. "New developments in gallium doped zinc oxide deposited on polymeric substrates by RF magnetron sputtering." Surface and Coatings Technology. 180 (2004): 20-25. Abstract
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Brida, D., E. Fortunato, H. Aguas, V. Silva, A. Marques, L. Pereira, I. Ferreira, and R. Martins. "New insights on large area flexible position sensitive detectors." Journal of non-crystalline solids. 299 (2002): 1272-1276. Abstract
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Gonçalves, C., J. Ferreira, E. Fortunato, I. Ferreira, R. Martins, AP Marvão, JI Martins, T. Harder, and R. Oppelt. "New metallurgical systems for electronic soldering applications." Sensors and Actuators A: Physical. 74.1 (1999): 70-76. Abstract
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Martins, R., H. Aguas, A. Cabrita, P. Tonello, V. Silva, I. Ferreira, E. Fortunato, and L. Guimaraes. "New nanostructured silicon films grown by PECVD technique under controlled powder formation conditions." Solar energy. 69 (2001): 263-269. Abstract
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Martins, Rodrigo, Isabel Ferreira, Ana Cabrita, Hugo Águas, Vitor Silva, and Elvira Fortunato. "New Steps to Improve a‐Si: H Device Stability by Design of the Interfaces." Advanced Engineering Materials. 3.3 (2001): 170-173. Abstract
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Fortunato, E., I. Ferreira, F. Giuliani, P. Wurmsdobler, and R. Martins. "New ultra-light flexible large area thin film position sensitive detector based on amorphous silicon." Journal of Non-Crystalline Solids. 266 (2000): 1213-1217. Abstract
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Fortunato, Elvira, Isabel Ferreira, Franco Giuliani, and Rodrigo Martins. "A New Ultra‐Light Flexible Large Area Thin Film PSD Based on Amorphous Silicon." Functional Materials, Volume 13 (1999): 421-427. Abstract
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Aguas, Hugo, Isabel Ferreira, Rodrigo Martins, Elvira Fortunato, R. Prabakaran, LuÍs Pereira, and E. Elangovan. "Optical and Microstructural Investigations of Porous Silicon Coated with a-Si: H Using PECVD Technique." Materials Science Forum. 587 (2008): 308-312. Abstract
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Baptista, JL, Isabel Ferreira, Rodrigo Martins, Andréi L. Kholkin, Elvira Fortunato, S. Iakovlev, and V. Shvartsman. "Optical and photoelectric properties of PZT films for microelectronic applications." Key Engineering Materials. 230 (2002): 563-566. Abstract
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Prabakaran, R., T. Monteiro, M. Peres, A. S. Viana, AF Da Cunha, H. Águas, A. Gonçalves, E. Fortunato, R. Martins, and I. Ferreira. "Optical and structural analysis of porous silicon coated with GZO films using rf magnetron sputtering." Thin Solid Films. 515.24 (2007): 8664-8669. Abstract
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Fortunato, Elvira, Luis Pereira, Pedro Barquinha, Isabel Ferreira, Rathinasamy Prabakaran, Goncalo Goncalves, Alexandra Goncalves, and R. Martins. "Oxide semiconductors: Order within the disorder." Philosophical Magazine. 89.28-30 (2009): 2741-2758. Abstract
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Martins, R., D. Costa, H. Aguas, F. Soares, A. Marques, I. Ferreira, PMR Borges, S. Pereira, L. Raniero, and E. Fortunato. "PART 1-I-Electronic, Magnetic and Photonic Materials-Insights on Amorphous Silicon Nip and MIS 3D Position Sensitive Detectors." Materials Science Forum. 514516 (2006): 13-17. Abstract
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Fortunato, E., A. Gonc@ 4alves, A. Marques, A. Pimentel, P. Barquinha, H. Aguas, L. Pereira, L. Raniero, G. GONCALVES, and I. Ferreira. "PART 1-I-Electronic, Magnetic and Photonic Materials-Multifunctional Thin Film Zinc Oxide Semiconductors: Application to Electronic Devices." Materials Science Forum. 514516 (2006): 3-7. Abstract
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Raniero, L., A. Goncalves, A. Pimentel, S. Zhang, I. Ferreira, P. M. Vilarinho, E. Fortunato, and R. Martins. "PART 1-I-Electronic, Magnetic and Photonic Materials-Role of Hydrogen Plasma on the Electrical and Optical Properties of Indium Zinc Transparent Conductive Oxide." Materials Science Forum. 514516 (2006): 63-67. Abstract
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Zhang, S., Z. Hu, L. Raniero, X. Liao, I. Ferreira, E. Fortunato, P. M. Vilarinho, L. Pereira, and R. Martins. "PART 1-I-Electronic, Magnetic and Photonic Materials-The Study of High Temperature Annealing of a-SiC: H Films." Materials Science Forum. 514516 (2006): 18-22. Abstract
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Ley, L., AH Mahan, Y. Xu, E. Iwaniczko, DL Williamson, BP Nelson, Q. Wang, H. Umemoto, Y. Nozaki, and M. Kitazoe. "PART A." (2002). Abstract
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Martins, R., I. Ferreira, B. Fernandes, and E. Fortunato. "Performances of a-Si: H films produced by hot wire plasma assisted technique." Vacuum. 52.1 (1999): 203-208. Abstract
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