Thin film metal oxide semiconductors deposited on polymeric substrates
- Citation:
- Fortunato, E.a, Nunes Marques Costa Águas Ferreira Costa Martins P. a A. a. "Thin film metal oxide semiconductors deposited on polymeric substrates." Materials Research Society Symposium Proceedings. Vol. 685. 2001. 146-151.
Abstract:
Highly textured transparent conducting ZnO:Al thin films have been prepared by r.f. magnetron sputtering. The films were deposited on polyester (Mylar type D, 100 μm thickness) and glass substrates at room temperature. Surface stylus profiling, X-ray diffraction, scanning electron microscopy, transmission electron microscope and Hall effect measurements as a function of temperature, using the van der Pauw technique have characterized the films. The samples are polycrystalline with a hexagonal wurtzite structure and a strong crystallographic c-axis orientation (002) perpendicular to the substrate surface (columnar structure). The ZnO:Al thin films with a resistivity as low as 3.6×10-2 Ωcm have been obtained, as deposited. © 2001 Materials Research Society.
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