Power electronics (PE) plays a major role in electrical devices and systems, namely in electromechanical drives, in motor and generator controllers, and in power grids, including high-voltage DC (HVDC) power transmission. PE is also used in devices for the protection against grid disturbances, like voltage sags or power breakdowns. To cope with these disturbances, back-up energy storage devices are used, like uninterruptible power supplies (UPS) and flywheels. Some of these devices may use superconductivity. Commercial PE semiconductor devices (power diodes, power MOSFETs, IGBTs, power Darlington transistors and others) are rarely (or never) experimented for cryogenic temperatures, even when designed for military applications. This means that its integration with HTS power devices is usually done in the hot environment, raising several implementation restrictions. These reasons led to the natural desire of characterising PE under extreme conditions, e. g. at liquid nitrogen temperatures, for use in HTS devices. Some researchers expect that cryogenic temperatures may increase power electronics' performance when compared with room-temperature operation, namely reducing conduction losses and switching time. Also the overall system efficiency may increase due to improved properties of semiconductor materials at low temperatures, reduced losses, and removal of dissipation elements. In this work, steady state operation of commercial PE semiconductors and devices were investigated at liquid nitrogen and room temperatures. Performances in cryogenic and room temperatures are compared. Results help to decide which environment is to be used for different power HTS applications.

Indium tin oxide (ITO) has been used as the prefered electrode material for the emerging area of transparent electronics, namely for thin-film transistors (TFTs) based on oxide semiconductors. This work pretends to investigate different materials to replace ITO in inverted-staggered TFTs based on gallium-indium-zinc oxide (GIZO), one of the most promissing oxide semiconductors for TFTs. The analyzed electrode materials are indium-zinc oxide (IZO), Ti, Mo and Ti/Au. Devices are analyzed with special focus on the contact resistance fundamentals, including the extraction of source/ drain series resistances and TFTs intrinsic parameters, such as intrinsic mobility (p\) and intrinsic threshold voltage (V Ti). The obtained contact resistance values are between 10 kΩ and 20 kΩ, and the best devices have field effect mobility ((μ FE) close to 25 cm 2/V s and on/off ratio close to 10 8. © 2008 WILEY-VCH Verlag GmbH & Co. KGaA.

Various metal oxide-silica nanocomposite films have been recently proposed as gas-sensitive materials. This paper presents results on cobalt oxide-SiO2 mesoporous nanocomposite thin films templated by a cationic surfactant. The films were deposited on glass substrate by dip-coating process, using [Co(CH3COO)2]·4H2O and tetraethoxysilane (TEOS) as starting materials. The effect of withdrawal speed, number of layers and thermal treatment on the crystalline structure, morphology, Co-doping states, optical, electrical and gas sensing properties of the thin films has been investigated using X-ray diffraction, atomic force microscopy, X-ray photoelectron spectroscopy, optical transmittance and room temperature photoreduction-oxidation data. © 2007 Elsevier B.V. All rights reserved.

Transparent wide band gap indium molybdenum oxide (IMO) thin films were rf sputtered on glass substrates at room temperature. The films were studied as a function of sputtering power (ranging 40-180 W) and sputtering time (ranging 2.5-20 min). The film thickness was varied in the range 50-400 nm. The as-deposited films were characterized by their structural (XRD), morphological (AFM), electrical (Hall Effect measurements) and optical (visible-NIR spectroscopy) properties. XRD studies revealed that the films are amorphous for the sputtering power ≤ 100 W and the deposition time ≤ 5 min, and the rest are polycrystalline with a strong reflection from (222) plane showing a preferential orientation. A minimum bulk resistivity of 2.65 × 10- 3 Ω cm and a maximum carrier concentration of 4.16 × 1020 cm- 3 are obtained for the crystalline films sputtered at 180 W (10 min). Whereas a maximum mobility (19.5  cm2 V- 1 s- 1) and average visible transmittance (∼ 85%) are obtained for the amorphous films sputtered at 80 W and 100 W respectively for 10 min. A minimum transmittance (∼ 18%) was obtained for the crystalline films sputtered at 180 W (∼ 305 nm thick). The optical band gap was found varying between 3.75 and 3.90 eV for various sputtering parameters. The obtained results are analyzed and corroborated with the structure of the films. © 2007 Elsevier B.V. All rights reserved.

This paper reports on a method and a test setup developed to measure the transient dark current and the spectral response characteristics of a-Si:H MIS photosensors. Using this method the segmented-gate/SiNx/a Si:H/n +/ITO structures have been characterized under different biasing conditions. The dependences of the dark and light signals on the refresh pulse amplitude, offset voltage and pulse width were measured and analyzed. It is found that the amplitude of the time-dependent component of the leakage current associated with charge trapping at the insulator-semiconductor interface can be significantly reduced by adjusting the offset voltage. The observed bias dependence of the spectral response characteristics is explained by analyzing the charge carrier transport in the absorption layer at different wavelengths of the incident light. © 2008 WILEY-VCH Verlag GmbH & Co. KGaA.

Co-doped TiO 2 films were characterized by spectroscopic ellipsometry to determine their thickness, deposition rate and optical properties as function of substance temperature and background gas composition. To fit the data we used a combination of a single Tauc-Lorentz oscillator with the Drude free electron model to take in account the free electrons present in the film. The Co doping and addition of H 2 to the gas phase during film growth cause the formation of a titanium oxide which containsfree electrons that absorb the energy of the red part of the spectrum, causing k to increase. The n of the film at 1.5 eV is about 2.3 eV. The fittings also show that the n of films decreases and k increase at the surface. This can be related to a segregation of Co to the surface, which in some cases, of high substrate temperature and high H 2 flow during deposition, can lead to and even higher concentration of free electrons at the surface. © 2008 WILEY-VCH Verlag GmbH & Co. KGaA.