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{Nitrite reductase from the sulfate-reducing bacterium Desulfovibrio desulfuricans ATCC 27774 is a multihaem (type c) membrane-bound enzyme that catalyzes the dissimilatory conversion of nitrite to ammonia. Crystals of the oxidized form of this enzyme were obtained using PEG and CaCl2 as precipitants in the presence of 3-(decylmethylammonium)propane-1-sulfonate and belong to the space group P2(1)2(1)2(1), With unit-cell parameters a = 78.94

The self-assembly of Ag[BF(4)] with trans-azobenzene in dichloromethane yields a new coordination polymer ([Ag(mu -trans-azobenzene)H(2)O] [BF(4)])(n) which was characterized by X-ray single crystal diffraction. The crystal consists of 1-D zigzag cationic chains made up from [Ag(H(2)O)](+) units linked by trans-azobenzene bridges and BF(4)(-) anions. Hydrogen bonding interactions between the chains and BF(4)(-) anions occur via intermolecular C-H . . .F and O-H . . .F contacts, and the crystal displays a 2-D supramolecular structure.

The reaction between [Cu(NCMe)(4)][PF6] and 1,1'-bis-(diphenylphosphino)-ferrocene (dppf) in several ratios, solvents, and conditions led to the synthesis and structural characterization of the Cu(I) complexes [Cu(dppf)(Odppf)] [PF6] (1), [(dppf)Cu(mu -dppf)Cu(dppf)][PF6](2) (2), and [(dppf)Cu(mu -Cl)(2)Cu(dppf)] (3). Although 1 and the cation in 2 were known, the first was structurally characterized for the first time, exhibiting a significant asymmetry in the coordination sphere of Cu(I)) owing to the presence of oxygen. In 2, the PF6- anion led to an interesting crystal packing with large open channels containing water. Finally, DFT calculations on a model of 3 showed that its HOMO exhibits, besides Fe, a significant Cu and Cl character, which is reflected in its electrochemical properties.

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In order to understand the kinetics of formation of interface/surface states and its correlation on the final device performance, a preliminary study was performed on MIS structures, before and after surface oxidation/passivation, using different oxidation techniques and oxides: thermal (in air), chemical (in H2O2) and oxygen plasma. The devices used in this work are based on a glass/Cr/a-Si:H(n+)/a-Si:H(i)/SiOx/Pd structures, where the amorphous silicon intrinsic layer (i a-Si:H) with a photosensitivity of 107 was deposited by a modified plasma enhanced chemical vapour deposition (PECVD) triode system. The electrical properties of a-Si:H MIS structures were investigated by measuring their diode current-voltage characteristics in the dark and under illumination as well as the spectral response, as a function of the various oxidation techniques. Infrared spectroscopy and spectroscopic ellipsometry were used as a complementary tool to characterise the oxidised surface.

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