Rodrigo Martins

Citation:

Kholkin, A.L., Iakovlev Fortunato Martins Ferreira Shvartsman Baptista S. E. R. "Optical and photoelectric properties of PZT films for microelectronic applications." Key Engineering Materials. 230-232 (2002): 563-566.

Abstract:

PbZrxTi1-xO3 (PZT) films are currently being investigated in view of their large switching polarization and piezoelectric coefficients useful for various applications. Besides, PZT films possess large photosensitivity, which, in combination with the above listed properties, can be a base for future microelectronic applications including photostrictive actuators and optical storage devices. In this work, PZT thin films of several compositions (x=0.2 and 0.45) were deposited on Pt-coated Si and ITO/glass substrates via modified sol-gel technique. Microstructures of the films were evaluated using XRD, SEM and AFM. The optical transmission measurements on PZT films deposited on ITO/glass revealed a high transparency over 80% and a band gap of about 3.4 eV. The observed photocurrent exhibited a maximum and was attributed to band-to-band optical transitions.

Notes:

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