Metal induced crystallization: Gold versus aluminium
- Citation:
- Pereira, L.a, Águas Vilarinho Fortunato Martins H. a P. b. "Metal induced crystallization: Gold versus aluminium." Journal of Materials Science. 40 (2005): 1387-1391.
Abstract:
In this work metal induced crystallization was studied using aluminium and gold deposited over 150 nm amorphous silicon films grown by LPCVD. Aluminium and gold layers with thickness between 1 and 5 nm were deposited on the silicon films and after that, the samples were annealed at 500°C from 5 up to 30 h. When the crystallization is induced through a gold layer, the Si crystalline fraction is higher than when using aluminium. For samples crystallized for 30 h at 500°C with 2 nm of metal a crystalline fraction of 57.5% was achieved using gold and only 38.7% when using aluminium. © 2005 Springer Science + Business Media, Inc.
Notes:
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