Influence of the process parameters on structural and electrical properties of r.f. magnetron sputtering ITO films

Citation:
Baía, I., Fernandes Nunes Quintela Martins B. P. M. "Influence of the process parameters on structural and electrical properties of r.f. magnetron sputtering ITO films." Thin Solid Films. 383 (2001): 244-247.

Abstract:

This paper presents results of the role of the oxygen concentration (CO) and the deposition pressure (pd) on structural and electrical properties of indium tin oxide films produced by r.f. magnetron sputtering. The films were annealed in air, followed by a reannealed stage in hydrogen, aiming to improve the film's transparency and conductivity. The results achieved show that the films texture grain size, structure and compactness is more influenced by CO than by pd, the same does not happen with the electrical properties.

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