Electrochromic behavior of NiO thin films deposited by e-beam evaporation at room temperature

Citation:
Pereira, S., A. Gonçalves, N. Correia, J. Pinto, L. Í. Pereira, R. Martins, and E. Fortunato, "Electrochromic behavior of NiO thin films deposited by e-beam evaporation at room temperature", Solar Energy Materials and Solar Cells, vol. 120, Part A, pp. 109-115, 2014.

Abstract:

In this work we report the role of thickness on electrochromic behavior of nickel oxide (NiO) films deposited by e-beam evaporation at room temperature on ITO-coated glass. The structure and morphology of films with thicknesses between 100 and 500 nm were analyzed and then correlated with electrochemical response and transmittance modulation when immersed in 0.5 M LiClO4–PC electrolyte. The NiO exhibits an anodic coloration, reaching for the thickest film a transmittance modulation of 66% between colored and bleached state, at 630 nm, with a color efficiency of 55 cm2 C−1. Very fast switch between states was obtained, where coloration and bleaching times are 3.6 s cm−2 and 1.4 s cm−2, respectively.

Notes:

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