Publications

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Fortunato, E., A. Pimentel, L. Pereira, A. Goncalves, G. Lavareda, H. Aguas, I. Ferreira, CN Carvalho, and R. Martins. "High field-effect mobility zinc oxide thin film transistors produced at room temperature." Journal of non-Crystalline solids. 338 (2004): 806-809. Abstract
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Fortunato, E., V. Assuncao, A. Goncalves, A. Marques, H. Aguas, L. Pereira, I. Ferreira, P. Vilarinho, and R. Martins. "High quality conductive gallium-doped zinc oxide films deposited at room temperature." Thin Solid Films. 451 (2004): 443-447. Abstract
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Martins, R., A. Macarico, I. Ferreira, R. Nunes, A. Bicho, and E. Fortunato. "Highly conductive and highly transparent n-type microcrystalline silicon thin films." Thin Solid Films. 303.1 (1997): 47-52. Abstract
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Filonovich, SA, H. Aguas, I. Bernacka-Wojcik, C. Gaspar, M. Vilarigues, LB Silva, E. Fortunato, and R. Martins. "Highly conductive p-type nanocrystalline silicon films deposited by RF-PECVD using silane and trimethylboron mixtures at high pressure." Vacuum. 83.10 (2009): 1253-1256. Abstract
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Marques, António, Isabel Ferreira, Rodrigo Martins, Patrícia Nunes, Hugo Águas, Elvira Fortunato, Daniel Costa, and Maria Elisabete V. Costa. "Highly conductive/transparent ZnO: Al thin films deposited at room temperature by rf magnetron sputtering." Key Engineering Materials. 230 (2002): 571-574. Abstract
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Bender, Marcus, Elvira Fortunato, Patrícia Nunes, Isabel Ferreira, António Marques, Rodrigo Martins, Nikos Katsarakis, Volker Cimalla, and George Kiriakidis. "Highly sensitive ZnO ozone detectors at room temperature." Japanese journal of applied physics. 42 (2003): 435. Abstract
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Fortunato, E., L. Raniero, L. Silva, A. Gonçalves, A. Pimentel, P. Barquinha, H. Aguas, L. Pereira, G. Gonçalves, and I. Ferreira. "Highly stable transparent and conducting gallium-doped zinc oxide thin films for photovoltaic applications." Solar Energy Materials and Solar Cells. 92.12 (2008): 1605-1610. Abstract
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Ferreira, I., E. Fortunato, R. Martins, and P. Vilarinho. "Hot-wire plasma assisted chemical vapor deposition: A deposition technique to obtain silicon thin films." Journal of applied physics. 91.3 (2002): 1644-1649. Abstract
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Filonovich, Sergej Alexandrovich, Hugo Águas, Tito Busani, António Vicente, Andreia Araújo, Diana Gaspar, Marcia Vilarigues, Joaquim Leitão, Elvira Fortunato, and Rodrigo Martins. "Hydrogen plasma treatment of very thin p-type nanocrystalline Si films grown by RF-PECVD in the presence of B (CH3) 3." Science and Technology of Advanced Materials. 13.4 (2012): 045004. Abstract
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Ferreira, I., E. Fortunato, P. Vilarinho, A. S. Viana, A. R. Ramos, E. Alves, and R. Martins. "Hydrogenated silicon carbon nitride films obtained by HWCVD, PA-HWCVD and PECVD techniques." Journal of non-crystalline solids. 352.9 (2006): 1361-1366. Abstract
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