Hot-wire plasma assisted chemical vapor deposition: A deposition technique to obtain silicon thin films
- Citation:
- Ferreira, I., E. Fortunato, R. Martins, and P. Vilarinho. "Hot-wire plasma assisted chemical vapor deposition: A deposition technique to obtain silicon thin films." Journal of applied physics. 91.3 (2002): 1644-1649.
Abstract:
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Notes:
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