Hydrogen plasma treatment of very thin p-type nanocrystalline Si films grown by RF-PECVD in the presence of B (CH3) 3

Citation:
Filonovich, Sergej Alexandrovich, Hugo Águas, Tito Busani, António Vicente, Andreia Araújo, Diana Gaspar, Marcia Vilarigues, Joaquim Leitão, Elvira Fortunato, and Rodrigo Martins. "Hydrogen plasma treatment of very thin p-type nanocrystalline Si films grown by RF-PECVD in the presence of B (CH3) 3." Science and Technology of Advanced Materials. 13.4 (2012): 045004.

Abstract:

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