Publications

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Journal Article
Martins, R. M. S., N. Schell, K. K. Mahesh, L. Pereira, R. J. C. Silva, and F. M. Braz Fernandes. "Texture Development and Phase Transformation Behavior of Sputtered Ni-Ti Films." Journal of Materials Engineering and Performance. 18.5-6 (2009): 543-547. Abstract
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Martins, R. M. S., N. Schell, H. Reuther, L. Pereira, K. K. Mahesh, R. J. C. Silva, and F. M. Braz Fernandes. "Texture development, microstructure and phase transformation characteristics of sputtered Ni-Ti Shape Memory Alloy films grown on TiN < 111 >." Thin Solid Films. 519.1 (2010): 122-128. Abstract
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Silva, RJ, L. A. Matlakhova, E. C. Pereira, A. N. Matlakhov, S. N. Monteiro, and R. J. S. Rodríguez. "Thermal cycling treatment and structural changes in Cu-Al-Ni monocrystalline alloys." Materials Science Forum. 514-516.PART 1 (2006): 692-696. AbstractWebsite
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Fortunato, E., V. Assuncao, A. Marques, A. Goncalves, H. Aguas, L. Pereira, I. Ferreira, FMB Fernandes, R. J. C. Silva, R. Martins, and C. Dias. "ZnO : Ga thin films produced by RF sputtering at room temperature: Effect of the power density." Advanced Materials Forum Ii. 455-456 (2004): 12-15. Abstract
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Fortunato, E., V. Assunção, A. Marques, A. Gonçalves, H. Águas, L. Pereira, I. Ferreira, FMB Fernandes, R. J. C. Silva, and R. Martins. "ZnO:Ga thin films produced by RF sputtering at room temperature: Effect of the power density." Materials Science Forum. 455-456 (2004): 12-15. AbstractWebsite
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Book Chapter
Martins, Rui M. S., N. Schell, H. Reuther, L. Pereira, R. J. C. Silva, K. K. Mahesh, Braz F. M. Fernandes, AT Marques, AF Silva, APM Baptista, C. Sa, FJLA Alves, LF Malheiros, and M. Vieira. "Characterization of Ni-Ti (Shape Memory Alloy) Thin Film by in-situ XRD and Complementary ex-situ Techniques." Advanced Materials Forum Iv. Vol. 587-588. 2008. 672-676. Abstract
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Aguas, H., L. Pereira, A. Goullet, R. Silva, E. Fortunato, R. Martins, JR Abelson, G. Ganguly, H. Matsumura, J. Robertson, and EA Schiff. "Correlation between the tunnelling oxide and I-V curves of MIS photodiodes." Amorphous and Nanocrystalline Silicon-Based Films-2003. Vol. 762. 2003. 217-222. Abstract
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