Cobalt oxide doped silica films were synthesized by a dip-coating technique. Initial compounds were cobalt acetate Co(CH3COO)2-4H 2O and tetraethoxysilane Si(OC2H5)4. The chemical composition was studied by X-ray diffraction and UV-Vis spectroscopy. The morphology analyses were carried out by means of atomic force microscopy. The average diameter of cobalt oxide dispersed particles increases with the molar ratio Co:Si and with the aging time of the initial colloidal solution. © 2009 American Institute of Physics.
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