Publications

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2010
Olziersky, Antonis, Pedro Barquinha, Anna Vila, Luis Pereira, Goncalo Goncalves, Elvira Fortunato, Rodrigo Martins, and Juan R. Morante. "Insight on the SU-8 resist as passivation layer for transparent Ga2O3-In2O3-ZnO thin-film transistors." Journal of Applied Physics. 108 (2010). AbstractWebsite
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2007
GONCALVES, G., E. Elangovan, P. Barquinha, L. Pereira, R. Martins, and E. Fortunato. "Influence of post-annealing temperature on the properties exhibited by ITO, IZO and GZO thin films." Thin Solid Films. 515 (2007): 8562-8566. AbstractWebsite
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2006
Pereira, L., L. Raniero, P. Barquinha, E. Fortunato, and R. Martins. "Impedance study of the electrical properties of poly-Si thin film transistors." Journal of Non-Crystalline Solids. 352 (2006): 1737-1740. AbstractWebsite
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Barquinha, P., A. Pimentel, A. Marques, L. Pereira, R. Martins, and E. Fortunato. "Influence of the semiconductor thickness on the electrical properties of transparent TFTs based on indium zinc oxide." Journal of Non-Crystalline Solids. 352 (2006): 1749-1752. AbstractWebsite
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Barquinha, P., E. Fortunato, A. Goncalves, A. Pimentel, A. Marques, L. Pereira, and R. Martins. "Influence of time, light and temperature on the electrical properties of zinc oxide TFTs." Superlattices and Microstructures. 39 (2006): 319-327. AbstractWebsite
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2005
Pereira, L., P. Barquinha, E. Fortunato, and R. Martins. "Influence of metal induced crystallization parameters on the performance of polycrystalline silicon thin film transistors." Thin Solid Films. 487 (2005): 102-106. AbstractWebsite
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Pereira, L., P. Barquinha, E. Fortunato, and R. Martins. "Influence of the oxygen/argon ratio on the properties of sputtered hafnium oxide." Materials Science and Engineering B-Solid State Materials for Advanced Technology. 118 (2005): 210-213. AbstractWebsite
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2004
Barquinha, P., L. Pereira, H. Aguas, E. Fortunato, and R. Martins. "Influence of the deposition conditions on the properties of titanium oxide produced by r.f. magnetron sputtering." Materials Science in Semiconductor Processing. 7 (2004): 243-247. AbstractWebsite
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