{Room-Temperature Cosputtered HfO[sub 2]–Al[sub 2]O[sub 3] Multicomponent Gate Dielectrics} | Luís Miguel Nunes Pereira

{Room-Temperature Cosputtered HfO[sub 2]–Al[sub 2]O[sub 3] Multicomponent Gate Dielectrics}

Citation:: Pei, Z. L., L. Pereira, G. Gonçalves, P. Barquinha, N. Franco, E. Alves, A. M. B. Rego, R. Martins, and E. Fortunato. "{Room-Temperature Cosputtered HfO[sub 2]–Al[sub 2]O[sub 3] Multicomponent Gate Dielectrics}." Electrochemical and Solid-State Letters. 12 (2009): G65.

Abstract:

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