Role of the deposition parameters in the uniformity of films produced by the plasma-enhanced chemical vapour deposition technique

Citation:
Martins, R., A. Maçarico, I. Ferreira, J. Fidalgo, and E. Fortunato. "Role of the deposition parameters in the uniformity of films produced by the plasma-enhanced chemical vapour deposition technique." Philosophical Magazine B. 76.3 (1997): 259-272.

Abstract:

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