@article {5564,
	title = {Hot-wire plasma assisted chemical vapor deposition: A deposition technique to obtain silicon thin films},
	journal = {Journal of applied physics},
	volume = {91},
	year = {2002},
	note = {n/a},
	pages = {1644-1649},
	publisher = {AIP},
	abstract = {n/a},
	isbn = {0021-8979},
	author = {Ferreira, I. and Fortunato, E. and Martins, R. and Vilarinho, P.}
}
