Growth of Polymorphous/Nanocrystalline Silicon Films Deposited by PECVD at 13.56 MHz

Citation:
Pereira, LuÍs, Isabel Ferreira, Rodrigo Martins, Hugo Águas, Elvira Fortunato, Leandro Raniero, S. Zang, and L. Boufendi. "Growth of Polymorphous/Nanocrystalline Silicon Films Deposited by PECVD at 13.56 MHz." Materials Science Forum. 455 (2004): 532-535.

Abstract:

n/a

Notes:

n/a