Silicon etching in CF4/O2 and SF6 atmospheres
- Citation:
- Silva, A., Leandro Raniero, E. Ferreira, Hugo Águas, Lu{\'ıs Pereira, Elvira Fortunato, and Rodrigo Martins. "Silicon etching in CF4/O2 and SF6 atmospheres." Materials Science Forum. Vol. 455. Trans Tech Publications, 2004. 120-123.
Abstract:
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Notes:
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