Properties of a-Si:H intrinsic films produced by HWPA-CVD technique
- Citation:
- Ferreira, I., Águas Pereira Fortunato Martins H. L. E. "Properties of a-Si:H intrinsic films produced by HWPA-CVD technique." Thin Solid Films. 451-452 (2004): 366-369.
Abstract:
In this paper, we investigate the optoelectronic properties and the photodegradation of amorphous silicon films produced by the hot wire plasma assisted technique (HWPA-CVD). We observed that hydrogen dilution in the gas phase plays an important role in the time dependence of the photoconductivity, which is correlated with an enhancement of defect density. We also compare the degradation of these films with those produced by plasma enhanced and by hot wire chemical vapour deposition techniques (PECVD and HW-CVD) and we found lower time dependence for the photodegradation of the films produced by HWPA-CVD technique © 2003 Elsevier B.V. All rights reserved.
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