Corrigendum to "Nickel assisted metal induced crystallization of silicon: Effect of native silicon oxide layer" [Thin Solid Films 511-512 (2006) 275-279] (DOI:10.1016/j.tsf.2005.12.005)

Citation:
Pereira, L.a, Martins Schell Fortunato Martins R. M. S. b. "Corrigendum to "Nickel assisted metal induced crystallization of silicon: Effect of native silicon oxide layer" [Thin Solid Films 511-512 (2006) 275-279] (DOI:10.1016/j.tsf.2005.12.005)." Thin Solid Films. 516 (2007): 104-105.

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