Manuel J. Mendes Website

© 2017 Elsevier B.V. Ultrasonic spray pyrolysis deposition of ZnO-based materials offers an attractive high-throughput low-cost route towards industrial production of high-quality transparent conductive oxide (TCO) thin-films. In this work, undoped and aluminium-doped ZnO films have been grown employing ultrasonic spray pyrolysis at relatively low-temperate (300 °C), followed by a post-annealing treatment. The role of Al concentration in the starting solution, as well as the rapid thermal annealing (RTA) atmosphere, were investigated and correlated to the morphological, structural, electrical and optical properties of the films. The remarkable enhancement of electrical conductivity attained here is mainly ascribed to the combined effects of: (1) homogenous incorporation of Al3+into the ZnO matrix, which enhances crystal quality providing higher electronic mobility; and (2) the RTA which releases the localized electrons caused by oxygen absorption and thereby increases the free carrier density. Under optimum deposition conditions, a low resistivity and a high optical transmittance around 4 × 10−3$Ømega$ cm and 87{%}, respectively, were obtained. The application of the RTA post-process after low temperature growth has several advantages relative to the direct growth at high temperature (usually 400–575 °C), such as shorter growth time and lower cost associated to the spray pyrolysis equipment requirements and usage. The results suggest that the electrical and optical properties of the ZnO:Al films can be further improved for solar cell applications by controlling the temperature of the post-deposition annealing in reducing atmosphere.

Metal nanoparticles and diffractive nanostructures are widely studied for enhancing light trapping efficiency in thin-film solar cells. Both have achieved high performance enhancements, but there are very few direct comparisons between the two. Also, it is difficult to accurately determine the parasitic absorption of metal nanoparticles. Here, we assess the light trapping efficiencies of both approaches in an identical absorber configuration. We use a 240 nm thick amorphous silicon slab as the absorber layer and either a quasi-random supercell diffractive nanostructure or a layer of self-assembled metal nanoparticles for light trapping. Both the plasmonic and diffractive structures strongly enhance the absorption in the red/near-infrared regime. At longer wavelengths, however, parasitic absorption becomes evident in the metal nanoparticles, which reduces the overall performance of the plasmonic approach. We have formulated a simple analytical model to assess the parasitic absorption and effective reflectivity of a plasmonic reflector and to demonstrate good agreement with the experimental data.