Properties of a-Si: H intrinsic films produced by HWPA-CVD technique
- Citation:
- Ferreira, Isabel, Hugo Águas, Luı́s Pereira, Elvira Fortunato, and Rodrigo Martins. "Properties of a-Si: H intrinsic films produced by HWPA-CVD technique." Thin solid films. 451 (2004): 366-369.
Abstract:
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Notes:
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