Properties of a-Si: H intrinsic films produced by HWPA-CVD technique

Citation:
Ferreira, Isabel, Hugo Águas, Luı́s Pereira, Elvira Fortunato, and Rodrigo Martins. "Properties of a-Si: H intrinsic films produced by HWPA-CVD technique." Thin solid films. 451 (2004): 366-369.

Abstract:

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