Properties of Nanocrystalline n-Type Silicon Films Produced by Hot Wire Plasma Assisted Technique

Citation:
Ferreira, I., Braz F. Fernandes, P. Vilarinho, E. Fortunato, and R. Martins. "Properties of Nanocrystalline n-Type Silicon Films Produced by Hot Wire Plasma Assisted Technique." MATERIALS RESEARCH SOCIETY SYMPOSIUM PROCEEDINGS. 664 (2001): A7. 6-A7. 6.

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