Study of the effect of different plasma-enhanced chemical vapour deposition reactor configurations on the properties of hydrogenated amorphous silicon thin films

Citation:
Águas, H., V. Silva, I. Ferreira, E. Fortunato, and R. Martins. "Study of the effect of different plasma-enhanced chemical vapour deposition reactor configurations on the properties of hydrogenated amorphous silicon thin films." Philosophical Magazine B. 80 (2000): 475-486.

Abstract:

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