Role of trimethylboron to silane ratio on the properties of p-type nanocrystalline silicon thin film deposited by radio frequency plasma enhanced chemical vapour deposition.

Citation:
Águas, H., SA Filonovich, I. Bernacka-Wojcik, E. Fortunato, and R. Martins. "Role of trimethylboron to silane ratio on the properties of p-type nanocrystalline silicon thin film deposited by radio frequency plasma enhanced chemical vapour deposition." Journal of nanoscience and nanotechnology. 10 (2010): 2547-2551.

Abstract:

n/a

Notes:

n/a