Martins, R., Macarico Ferreira Nunes Bicho Fortunato A. I. R. "
Correlation between electrical-optical and structural properties of microcrystalline silicon N type films."
Materials Research Society Symposium - Proceedings. Vol. 420. 1996. 807-812.
AbstractWide band gap microcrystalline silicon films have aroused considerable interest since they combine some electro-optical advantages of amorphous and crystalline materials highly important to produce electro-optical devices such as TFTs and solar cells. In this paper we present results concerning the electro-optical characteristics of highly transparent and conductive n-type μc-Si based films. Here, emphasis is given to the production of n-type μc-films with optical gaps of 2.3 eV and dark conductivity's of 6.5 Scm-1.
Martins, R., Ferreira Cabrita Fortunato I. A. E. "
Improvement of a-Si:H device stability and performances by proper design of the interfaces."
Journal of Non-Crystalline Solids. 266-269 B (2000): 1094-1098.
AbstractThis paper deals with a new design method for the interfaces of a-Si:H pin solar cells that improves the stability and performances of devices deposited in a single batch chamber process. The method consists in removing a deposited sacrificial layer placed between the p/i and/or i/n interfaces by etching. This layer is an absorber of defects and impurities that are introduced in the interfaces, mainly from the chamber walls cross-contamination and the substrate surface. The results achieved increase the device fill factor and short circuit current density, respectively towards 75% and 16.3 mA cm-2, with a final efficiency of about 10%, before light soaking experiments. © 2000 Elsevier Science B.V. All rights reserved.
Martins, R., Ferreira Carvalho Guimarães I. N. L. "
Engineering of plasma deposition systems used for producing large area a-Si:H devices."
Journal of Non-Crystalline Solids. 137-138 (1991): 757-760.
AbstractOne of the main problems in producing large area amorphous silicon devices concerns films uniformity. In this paper we present data concerning the role of reactor geometry and design and on the film performances as well as the problems related to mechanical mismatches in scaling up the reactor size. © 1991 Elsevier Science Publishers B.V. All rights reserved.
Martins, R., Lavareda Soares Fortunato G. F. E. "
Detection limit of large area 1D thin film position sensitive detectors based in a-Si:H P.I.N. diodes."
Materials Research Society Symposium - Proceedings. Vol. 377. 1995. 791-796.
AbstractThe aim of this work is to provide the basis for the interpretation of the steady state lateral photoeffect observed in p-i-n a-Si:H 1D Thin Film Position Sensitive Detectors (1D TFPSD). The experimental data recorded in 1D TFPSD devices with different performances are compared with the predicted curves and the obtained correlation's discussed.
Martins, R.a, Costa Águas Soares Marques Ferreira Borges Fortunato D. a H. a. "
Detection limits of a nip a-Si:H linear array position sensitive detector."
Materials Research Society Symposium Proceedings. Vol. 808. 2004. 507-512.
AbstractThis paper presents results of the spatial and frequency detection limits of an integrated array of 32 one-dimensional amorphous silicon thin film position sensitive detectors with a nip structure, under continuous and pulsed laser operation conditions. The data obtained show that 0.45×0.06 cm arrays, occupying a total active area of about 1 cm2 have a spatial resolution better than 10 μm (modulation transfer function of about 0.2), with a cut-off frequency of about 6.8 KHz. Besides that, under pulsed laser conditions the device non-linearity has its minimum (about 1.6%), for a frequency of about 200Hz. Up to the limits of the cut-off frequency, the device non-linearity increases to values above 4%.
Martins, R., Fantoni Vieira A. M. "
Tailoring defects on amorphous silicon pin devices."
Journal of Non-Crystalline Solids. 164-166 (1993): 671-674.
AbstractThis paper deals with a new model and structure able to tailor defects in pin devices. The model assumes the usual density of states profile, including donor and acceptor like states inside the mobility gap and has the capability to simulate the transient and steady state device behavior. The new structure is based in two interfacial defectous layers, located at the junctions, acting as "gettering" centers to tailor the defects. The role of the interlayer and its thickness on device performances will be also discussed. © 1993.
Malik, A.a, Sêco Fortunato Martins A. c E. b. "
Microcrystalline thin metal oxide films for optoelectronic applications."
Journal of Non-Crystalline Solids. 227-230 (1998): 1092-1095.
AbstractWe report the properties and optoelectronic applications of transparent and conductive indium and tin oxide films prepared by the spray pyrolysis method and doped with Sn or F, respectively. The film properties have been measured using X-ray diffraction, optical and electrical absorption. As examples of applications we produced a set of selective optical detectors for different spectral regions, covering the wavelength range from 0.25 to 1.1 μm, based on metal oxide-semiconductor heterostructures and using different substrates such as: GaP, GaSe, AlxGa1-xAs, GaAs and Si. The fabricated devices exhibit several features such as: production simplicity, high quantum efficiency, uniform sensitivity over the entire active area and a high response speed. Finally, we present a high quantum efficiency and solar blind monocrystalline zinc sulphide optical sensor fabricated by spray deposition as an alternative to the ultraviolet-enhanced SiC and GaN photodetectors and the performances of a solar cell. © 1998 Elsevier Science B.V. All rights reserved.