Raniero, L., Ferreira Pimentel Gonçalves Canhola Fortunato Martins I. A. A. "
Role of hydrogen plasma on electrical and optical properties of ZGO, ITO and IZO transparent and conductive coatings."
Thin Solid Films. 511-512 (2006): 295-298.
AbstractIn this paper we study the electro-optical behaviour and the structure of different TCOs, namely the ZGO, ITO and IZO films before and after being submitted to different hydrogen plasma power densities, for times up to 60 s, aiming their use in a/nc-Si:H solar cells. The results achieved show that ZGO films do not reduce for all plasma conditions used and so, the solar cells produced evidence high current density, about 17% larger that the one recorded in the other TCOs. Besides that, by combining the electrical and optical characteristics of the films through a figure of merit, the data reveal that for the ITO and IZO films even when exposed to very low hydrogen power plasma, the figure of merit is reduced up to 50%. © 2005 Elsevier B.V. All rights reserved.
Vieira, M., Fortunato Lavareda Carvalho Martins E. G. C. "
Role of photodegradation on the μτ product and microstructure of the a-Si:H pin devices."
Materials Research Society Symposium Proceedings. Vol. 297. 1993. 637-642.
AbstractPIN solar cells were light soaked up to 60 hours. The cell characteristics, the optoelectronic properties and the microstructure parameter (R = I2100/I2100+I2000) as well as the hydrogen content (CH) and density of states (g(Ef)) of the active i-layer were monitored throughout the entire light induced degradation process and compared with the correspondents μτ product (for both carriers) inferred through steady photoconductivity and FST measurements. Data show a strong correlation between the decrease of μτ product for electron and the increase of the fraction of hydrogen bonded on internal surfaces (R increases from 0.1 to 0.4) suggesting structural changes during the light induced defects' formation. For holes, the μτ product remains approximately constant and only dependent on the initial hydrogen content. As g(Ef) increases, μτ presents an asymmetrical decrease showing that electrons are more sensitive to defects' growth than holes. We also observe that the rate of degradation is faster for samples having the lowest defect densities, R and CH, showing that the amount of degradation is not a simple function of the photon exposure (Gt product) but also depends on the material microstructure.
Pereira, L., Águas Raniero Martins Fortunate Martins H. L. R. "
Role of substrate on the growth process of polycrystalline silicon thin films by low-pressure chemical vapour deposition."
Materials Science Forum. 455-456 (2004): 112-115.
AbstractThis paper deals with the role the substrate on the structure of undoped and n-doped polycrystalline silicon (poly-Si) films produced by Low Pressure Chemical Vapour Deposition (LPCVD). The structural and electrical properties of the films deposited on glass, glass covered with molybdenum (Mo), oxidised crystalline silicon and oxidised crystalline silicon covered with Mo were analysed using X-ray diffraction and Spectroscopic Ellipsometry, dark conductivity and Hall effect measurements. Undoped poly-Si films deposited over Mo present modifications in the crystalline structure relatively to those deposited on the other substrates. The presence of Mo changes the preferential growth orientation, enhancing the Si {111} grains orientation, leading to more compact films. The electrical measurements also confirm that the films grown on Mo substrates present better characteristics. Some differences are also observed during the initial growth stages when using glass or oxidised silicon. Very thin n-doped films present a less effective doping effect when deposited on oxidised silicon than the ones deposited on glass substrates.
Fortunato, E., Martins R. "
Role of the collecting resistive layer on the static characteristics of 2D a-Si:H thin film position sensitive detector."
Materials Research Society Symposium - Proceedings. Vol. 507. 1999. 303-308.
AbstractThe aim of this work is to present an analytical model able to interpret the role of the thin collecting resistive layer on the static performances exhibited by 2D amorphous silicon hydrogenated pin thin film position sensitive detectors. In addition, experimental results concerning the device linearity and spatial resolution are presented and checked against the predicted values of the analytical model proposed.